Zobrazeno 1 - 10
of 117
pro vyhledávání: '"Shin Jae, You"'
Autor:
Minsu Choi, Shin-Jae You, Jinwoo Jung, Changseok Cho, Yongshik Lee, Cheonyoung Kim, Jungje Ha, Hyunsoo Lee, Youbin Seol
Publikováno v:
AIP Advances, Vol 14, Iss 6, Pp 065022-065022-7 (2024)
In Radar Cross Section (RCS) reduction as a military technology, dielectric barrier discharge (DBD) plasma is one of the most effective methods. For RCS reduction, it is reported that high plasma density over 1013/cm3 is required with high power and
Externí odkaz:
https://doaj.org/article/d3450b17e2b04cf0a66c96849ba8a7b1
Autor:
Hee-Jung Yeom, Min Young Yoon, Daehan Choi, Youngseok Lee, Jung-Hyung Kim, Shin-Jae You, Hyo-Chang Lee
Publikováno v:
ACS Omega, Vol 8, Iss 36, Pp 32450-32457 (2023)
Externí odkaz:
https://doaj.org/article/da121a37c39641ad8accc680824953d4
Autor:
Si-jun Kim, Young-seok Lee, Chul-hee Cho, Min-su Choi, In-ho Seong, Jang-jae Lee, Dae-woong Kim, Shin-jae You
Publikováno v:
Scientific Reports, Vol 12, Iss 1, Pp 1-11 (2022)
Abstract Arcing is a ubiquitous phenomenon and a crucial issue in high-voltage applied systems, especially low-temperature plasma (LTP) engineering. Although arcing in LTPs has attracted interest due to the severe damage it can cause, its underlying
Externí odkaz:
https://doaj.org/article/3b0700bbd2204f7282d2176948509caa
Autor:
Minsu Choi, Shin-Jae You, Jinwoo Jung, Changseok Cho, Yongshik Lee, Cheonyoung Kim, Jungje Ha, Hyunsoo Lee, Youbin Seol
Publikováno v:
Sensors, Vol 23, Iss 22, p 9170 (2023)
This paper deals with the practical application of Radar Cross Section (RCS) reduction technology using plasma. Although various plasma application technologies for RCS reduction have been studied, there are still many issues to be addressed for prac
Externí odkaz:
https://doaj.org/article/347ad17937274a91ba2e1862c3f5bf82
Publikováno v:
AIP Advances, Vol 12, Iss 12, Pp 125117-125117-5 (2022)
In this paper, characteristics of electron parameters of SF6/O2 and inert gas mixture in a capacitively coupled plasma were studied. Here, gases such as He, Ar, and Xe were added to SF6/O2 mixture and electron energy probability functions (EEPFs) wer
Externí odkaz:
https://doaj.org/article/bec94f92b06b4f4da37b554482560d0c
Autor:
Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, Shin-Jae You
Publikováno v:
Sensors, Vol 23, Iss 5, p 2521 (2023)
The importance of monitoring the electron density uniformity of plasma has attracted significant attention in material processing, with the goal of improving production yield. This paper presents a non-invasive microwave probe for in-situ monitoring
Externí odkaz:
https://doaj.org/article/529c4a8337e847e3ba60023453870fb4
Publikováno v:
Nanomaterials, Vol 12, Iss 24, p 4457 (2022)
SiO2 etching characteristics were investigated in detail. Patterned SiO2 was etched using radio-frequency capacitively coupled plasma with pulse modulation in a mixture of argon and fluorocarbon gases. Through plasma diagnostic techniques, plasma par
Externí odkaz:
https://doaj.org/article/2884197c289e476d8ad4d03186fff46e
Autor:
Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi, Shin-Jae You
Publikováno v:
Nanomaterials, Vol 12, Iss 21, p 3798 (2022)
One of the cleaning processes in semiconductor fabrication is the ashing process using oxygen plasma, which has been normally used N2 gas as additive gas to increase the ashing rate, and it is known that the ashing rate is strongly related to the con
Externí odkaz:
https://doaj.org/article/045575d698d647b4aec66124a4abaf1e
Autor:
Si-jun Kim, In-ho Seong, Young-seok Lee, Chul-hee Cho, Won-nyoung Jeong, Ye-bin You, Jang-jae Lee, Shin-jae You
Publikováno v:
Sensors, Vol 22, Iss 15, p 5871 (2022)
As the conventional voltage and current (VI) probes widely used in plasma diagnostics have separate voltage and current sensors, crosstalk between the sensors leads to degradation of measurement linearity, which is related to practical accuracy. Here
Externí odkaz:
https://doaj.org/article/932ea57d62c34382adf6f1854152c408
Autor:
Si-jun Kim, Sang-ho Lee, Ye-bin You, Young-seok Lee, In-ho Seong, Chul-hee Cho, Jang-jae Lee, Shin-jae You
Publikováno v:
Sensors, Vol 22, Iss 15, p 5487 (2022)
As the importance of measuring electron density has become more significant in the material fabrication industry, various related plasma monitoring tools have been introduced. In this paper, the development of a microwave probe, called the measuremen
Externí odkaz:
https://doaj.org/article/a3833db2845441578bf753d363b77064