Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Shikha Somani"'
Autor:
Frank E. Gennari, Karthik Krishnamoorthy, Shikha Somani, Ya-Chieh Lai, Sriram Madhavan, Piyush Pathak, Fadi Batarseh, Wei-Long Wang, Uwe Paul Schroeder, Philippe Hurat, Jason Sweis, Bob Pack, Jaime Bravo
Publikováno v:
SPIE Proceedings.
At advanced technology nodes (sub-22 nm), design rules become very complicated as interactions between multiple layers become more complex, while the number of design elements within the optical radius increases. As a result, one may possibly encount
Publikováno v:
The Journal of Physical Chemistry C. 115:11507-11513
We use B3LYP hybrid density functional theory to investigate atomistic mechanisms for the atomic layer deposition (ALD) of tantalum nitride (TaN) grown using tert-butylimidotris(diethylamido)tantalum [(tBuN)(NEt2)3Ta, TBTDET], and ammonia (NH3) as pr
Publikováno v:
Macromolecules. 43:10679-10691
Polymers undergo a sharp coil−stretch transition in extension dominated flows when the strain rate exceeds a critical strain rate. We investigate this transition in both Θ solvents and good solvents using Brownian dynamics simulations. The polymer
Autor:
Rani S. Ghaida, Shikha Somani, Carl P. Babcock, Jingyu Wang, Sarah McGowan, Yang Y. Ping, Sriram Madhavan, Piyush Pathak, Fadi Batarseh, Piyush Verma
Publikováno v:
SPIE Proceedings.
Optical Proximity Correction (OPC) is a compute-intensive process used to generate photolithography mask shapes at advanced VLSI nodes. Previously, we reported a modified two-step OPC flow which consists of a first pattern replacement step followed b
Publikováno v:
SPIE Proceedings.
Pattern based design rule checks have emerged as an alternative to the traditional rule based design rule checks in the VLSI verification flow [1]. Typically, the design-process weak-points, also referred as design hotspots, are classified into patte
Publikováno v:
SPIE Proceedings.
Traditional physical design verification tools employ a deck of known design rules, each of which has a pre-defined pass/fail criteria associated with it. While passing a design rule deck is a necessary condition for a VLSI design to be manufacturabl
Publikováno v:
SPIE Proceedings.
Techniques to control Across Chip CD Variation are very important in IC design, since it directly impacts the electrical timing and functionality of the designs. VLSI designs today include a rich variety of electrical devices (different gate oxide th
Publikováno v:
SPIE Proceedings.
Full chip model based Optical Proximity Correction (OPC) at advanced nodes involves iteratively modifying the drawn polygon shapes while simulating them through complex optical and resist models. Due to the computational complexity of the models and