Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Shigeru, Tahara"'
Autor:
Antoun, Gaëlle, Dussart, Remi, Lefaucheux, Philippe, Tillocher, Thomas, Shigeru, Tahara, yamazaki, kumiko, Yatsuda, Koichi, Faguet, Jacques, Maekawa, Kaoru
Publikováno v:
XXXIV International Conference on Phenomena in Ionized Gases-10th International Conference on Reactive Plasmas
XXXIV International Conference on Phenomena in Ionized Gases-10th International Conference on Reactive Plasmas, Jul 2019, Sapporo, Japan
XXXIV International Conference on Phenomena in Ionized Gases-10th International Conference on Reactive Plasmas, Jul 2019, Sapporo, Japan
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::5dad473bc1ac112558967bf1623c662e
https://hal.archives-ouvertes.fr/hal-02311288
https://hal.archives-ouvertes.fr/hal-02311288
Autor:
Chanson, Romain, Tillocher, Thomas, Lefaucheux, Philippe, Dussart, Remi, Zhang, Liping, De Marneffe, Jean-Francois, Shen, Peng, Maekawa, Kaoru, Yatsuda, Koichi, Shigeru, Tahara
Publikováno v:
40th International Symposium on Dry Process
40th International Symposium on Dry Process, Nov 2018, Nagoya, France
40th International Symposium on Dry Process, Nov 2018, Nagoya, France
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::1789cbd4821cea4ee9fd1b1c3d25da6c
https://hal.archives-ouvertes.fr/hal-02311275
https://hal.archives-ouvertes.fr/hal-02311275
Autor:
Antoun, Gaëlle, Lefaucheux, Philippe, Tillocher, Thomas, Dussart, Remi, Shigeru, Tahara, yamazaki, kumiko, Yatsuda, Koichi, Faguet, Jacques, Maekawa, Kaoru
Publikováno v:
40th International Symposium on Dry Process
40th International Symposium on Dry Process, Nov 2018, Nagoya, Japan
40th International Symposium on Dry Process, Nov 2018, Nagoya, Japan
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::eb36698df4f22f8e0d7cb4e7d19ae014
https://hal.archives-ouvertes.fr/hal-02311267
https://hal.archives-ouvertes.fr/hal-02311267
Autor:
Paulina Rincon Delgadillo, Boon Teik Chan, Jean-Francois de Marneffe, Kaidong Xu, Doni Parnell, Werner Boullart, Shigeru Tahara, Eiichi Nishimura, Roel Gronheid
Publikováno v:
Microelectronic Engineering. 123:180-186
We demonstrated DSA pattern transfer with 20-25nm of block-copolymer.We developed several approaches to increase the etch selectivity of PS towards PMMA.We introduced SiCl4 encapsulation prior to Si3N4 hardmask etch.LWR/LER of 2.5-2.6nm can be demons
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c05d54cab47903db4e98b64599aa7480
https://doi.org/10.1016/j.mee.2014.07.028
https://doi.org/10.1016/j.mee.2014.07.028
Autor:
Leroy, Floriane, Brochu, Nataniel, Chanson, Romain, Dussart, Remi, Tillocher, Thomas, De Marneffe, Jean-Francois, Zhang, Liping, Maekawa, Kaoru, Yatsuda, Koichi, Shigeru, Tahara, Dussarrat, Christian
Publikováno v:
Plasma Etch and Strip in Microtechnology
Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France
Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::1e9493925b76a7f603bd1bcbd1a18a28
https://hal.archives-ouvertes.fr/hal-01344722
https://hal.archives-ouvertes.fr/hal-01344722
Autor:
Ivan Ciofi, Frederic Lazzarino, Eiichi Nishimura, Shigeru Tahara, Baojun Tang, Takeru Maeshiro, Jürgen Bömmels, Kristof Croes, Keiichi Shimoda, Fumiko Yamashita, Zsolt Tokei, Lianggong Wen
Publikováno v:
2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM).
Cu wires patterning by direct etch methods is investigated at 300mm wafer level. Cross-sectional sidewall profiles with tapering angles around 74.5° are obtained with a mid-line width of 44 nm, which paves the way to further scaling of this techniqu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0d41f1af6cab0d20fc569b5c5bcd726a
https://doi.org/10.1109/iitc-mam.2015.7325613
https://doi.org/10.1109/iitc-mam.2015.7325613
Autor:
Tetsuya Ohishi, D. Radisic, Koichi Yatsuda, Werner Boullart, Sven Cornelissen, Eiichi Nishimura, Mauricio Manfrini, Vasile Paraschiv, Shigeru Tahara
Publikováno v:
SPIE Proceedings.
In this paper we report on the patterning challenges for the integration of Spin-Transfer Torque Magneto-Resistive- Random-Access Memory (STT MRAM). An overview of the different patterning approaches that have been evaluated in the past decade is pre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eebbd9d7e19899efbfbe0fe255fa72fd
https://doi.org/10.1117/12.2013602
https://doi.org/10.1117/12.2013602
Autor:
Doni Parnell, Nadia Vandenbroeck, Shigeru Tahara, Kathleen Nafus, Ainhoa Romo-Negreira, Mark Somervell, Roel Gronheid, Todd R. Younkin, Paulina Rincon Delgadillo, Steven Demuynck, Boon Teik Chan
Publikováno v:
SPIE Proceedings.
Directed Self-Assembly (DSA) has become a promising alternative for generating fine lithographic patterns. Since contact holes are among the most difficult structures to resolve through traditional lithographic means, directed selfassembly applicatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c004a71ba0f686d2f4286c5f349bf47f
https://doi.org/10.1117/12.2012353
https://doi.org/10.1117/12.2012353
Autor:
Benjamen M. Rathsack, Mariko Ozawa, Keiji Akai, Hiroyuki Iwaki, Ainhoa Romo Negreira, Mark Somervell, Koichi Yatsuda, Kathleen Nafus, Takahiro Kitano, Keiji Tanouchi, Eiichi Nishimura, Makato Muramatsu, Seiji Nagahara, Shigeru Tahara
Publikováno v:
SPIE Proceedings.
Directed self-assembly (DSA) has the potential to extend scaling for both line/space and hole patterns. DSA has shown the capability for pitch reduction (multiplication), hole shrinks, CD self-healing as well as a pathway towards LWR and pattern coll
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b745e330e3c1ae76c5c2158acc5ce0c2
https://doi.org/10.1117/12.2012018
https://doi.org/10.1117/12.2012018
Autor:
H. Kakuno, Norihisa Shibayama, C. Nakashima, Shigeru Tahara, Haruhiko Himura, Zensho Yoshida, Junji Morikawa
Publikováno v:
AIP Conference Proceedings.
The toroidal magnetic trap has an advantage in achieving long orbit lengths, which allows us to apply a slow process of energy reduction to the trapped particles. On Proto-RT (Prototype Ring Trap), we have demonstrated the confinement of a pure elect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::675eb39634deb32b45570c1cbbbd2def
https://doi.org/10.1063/1.1302142
https://doi.org/10.1063/1.1302142