Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Shigemi Oono"'
Autor:
Hideaki Sakurai, Naoya Hayashi, Tooru Shibata, Hideo Funakoshi, Kotaro Ooishi, Masatoshi Kaneda, Shigenori Kamei, Yoshiki Okamoto, Masamitsu Itoh, Shigemi Oono
Publikováno v:
SPIE Proceedings.
CD error caused by loading effect is becoming a significant issue in mask fabrication. At the same time, quantification method of CD error caused by loading effect has not been established in many cases because it is very difficult to measure the err
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::521dbff1c1742980868704a37aa43a50
https://doi.org/10.1117/12.637275
https://doi.org/10.1117/12.637275
Autor:
Gaston Lee, Wolfram Porsche, Tetsushi Miyamoto, Hideo Funakoshi, Shinji Koga, Yoshiki Okamoto, Shigenori Kamei, Shigemi Oono, Takahiro Fukai, Rusty Cantrell, Hiroshi Asai, Martin Tschinkl, Tatsuhito Kotoda, Axel Feicke, Peter Tichy, Kazuhiro Takeshita
Publikováno v:
SPIE Proceedings.
The challenges, mask manufacturing is faced with, are more and more dominating the semiconductor industry as the pattern sizes shrink. Today's mask patterns have reached sizes that are common in wafer manufacturing. Looking into the industry, we can
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5aea07948e24d03fa205a2e63281f5b9
https://doi.org/10.1117/12.568820
https://doi.org/10.1117/12.568820