Výsledky vyhledávání - "Shigemasa Nakasugi"

Dielectric Relaxation Behavior of Ferroelectric Smectic-A Phase in Dimeric Molecules

Autor: Shigemasa Nakasugi, Sungmin Kang, Junji Watanabe, Masato Sone, Hiroki Ishizaki

Publikováno v: IEEJ Transactions on Fundamentals and Materials. 142:152-158

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9f86bf50a49d8d19be813e775b44b8b0
https://doi.org/10.1541/ieejfms.142.152

Zobrazit plný text záznamu

Huge dielectric constants of the ferroelectric smectic-A phase in bent-shaped dimeric molecules

Autor: Masato Sone, Hiroki Ishizaki, Sungmin Kang, Shigemasa Nakasugi, Junji Watanabe

Publikováno v: Materials Advances. 2:7017-7023

We present the dielectric relaxation properties of the ferroelectric smectic-A (SmAPF) phase formed by a mixture of bent-shaped dimeric molecules α,ω-bis(4-alkoxyanilinebenzylidene-4′-carbonyloxy)pentanes with different alkyl chain lengths. The S

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6ba6e098b93ea256d2d0791c4d68c238
https://doi.org/10.1039/d1ma00015b

Zobrazit plný text záznamu

Planarization of topography with spin-on carbon hard mask

Autor: Yusuke Hama, Takanori Kudo, Go Noya, Munirathna Padmanaban, Shigemasa Nakasugi, Maki Ishii

Publikováno v: SPIE Proceedings.

Spin-on-carbon hard mask (SOC HM) has been used in semiconductor manufacturing since 45nm node as an alternative carbon hard mask process to chemical vapor deposition (CVD). As advancement of semiconductor to 2X nm nodes and beyond, multiple patterni

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::eb642b97c8e396131943266a5c9d777e
https://doi.org/10.1117/12.2218504

Zobrazit plný text záznamu

Synthesis and characterization of self-assembling amphiphilic aromatic amide dendrons

Autor: Masa-aki Kakimoto, Shigemasa Nakasugi, Masatoshi Tokita, Teruaki Hayakawa, Junji Watanabe

Publikováno v: High Performance Polymers. 18(5):761-775

The sub-micrometer and micrometer-scale self-assembled structures of a series of amphiphilic dendrons constructed from the building blocks of aromatic amide, triethylene glycol, and octadecyl groups were evaluated. The dendrons from the first to the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e47efb7d05d10c75ece1a69a1a2a4c2f
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100523246

Zobrazit plný text záznamu

A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning

Autor: Munirathna Padmanaban, Joonyeon Cho, Huirong Yao, Hiroshi Yanagita, Takanori Kudo, Yi Cao, Shigemasa Nakasugi, YoungJun Her, Fumihiro Suzuki, Georg Pawlowski, Misumi Motoki, Jin Li, Ide Yasuaki

Publikováno v: SPIE Proceedings.

Shot noise is a significant issue in EUV lithography, especially in printing small area features like contact holes. This brings about LCDU (Local CD Uniformity) issue and LCDU-sensitivity tradeoff. This paper describes efforts to alleviate this issu

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::57791fcf86045b9f925579f8b708c6fa
https://doi.org/10.1117/12.2046237

Zobrazit plný text záznamu

Vyhledávací nástroje:

Upřesnit hledání