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pro vyhledávání: '"Sheng-Chi J. Chin"'
Autor:
Shih-Ming Chang, Chih-Cheng C. Chin, Hong-Chang Hsieh, Wen-Chuan Wang, Sheng-Chi J. Chin, Chi-Lun Lu
Publikováno v:
SPIE Proceedings.
Nowadays, the CD (Critical Dimension) control on masks manufacturing plays an important role in photolithography process for 90-nm node technology and below. The process performance of photolithography will degrade severely even when the mask CD erro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d5dc047807b369e1efb655fea191c34
https://doi.org/10.1117/12.504193
https://doi.org/10.1117/12.504193
