Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Shen Yaoting"'
Publikováno v:
2020 China Semiconductor Technology International Conference (CSTIC).
In soak and spike anneal process, applied materials vantage family tools are widely used in 28/40nm and beyond. The domestic machines of this kind, being still on the stage of development, have a great potentiality in the semiconductor industry. As a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ae2579d9341526ccab00a8948db9282
https://doi.org/10.1109/cstic49141.2020.9282456
https://doi.org/10.1109/cstic49141.2020.9282456
Publikováno v:
2020 China Semiconductor Technology International Conference (CSTIC).
For advanced technology node, laser anneal is widely used for ultra-shallow and low resistivity junctions which are needed to suppress short-channel effects and improve device performance. However, if wafer is not put in proper position, laser anneal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b948a245439895597f1f0ecfc20b678
https://doi.org/10.1109/cstic49141.2020.9282580
https://doi.org/10.1109/cstic49141.2020.9282580
Publikováno v:
2020 China Semiconductor Technology International Conference (CSTIC).
The contact resistance between silicides and Si/SiGe substrates plays more and more important role in both the intrinsic device resistance and parasitic external resistance at 14nm FinFET technology and beyond. Titanium silicide (TiSix) is commonly u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41f832fe05b996fbeb02534e1535b12a
https://doi.org/10.1109/cstic49141.2020.9282509
https://doi.org/10.1109/cstic49141.2020.9282509