Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Shannon B, Hill"'
Publikováno v:
Applied Surface Science. 479:557-568
X-ray Photoelectron Spectroscopy (XPS) and Spectroscopic Ellipsometry (SE) have been used to interrogate and spatially map changes that occur to ultra-thin (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0726fee909c3b7cec13ccf3e6d842bc0
https://doi.org/10.1016/j.apsusc.2019.02.122
https://doi.org/10.1016/j.apsusc.2019.02.122
Publikováno v:
Surface and Interface Analysis. 49:1187-1205
We discuss the problem of quantifying common sources of statistical uncertainties for analyses of trace levels of surface contamination using X-ray photoelectron spectroscopy. We examine the propagation of error for peak-area measurements using commo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::766d3d2a95601cd3cc5a6b365279d91e
https://doi.org/10.1002/sia.6285
https://doi.org/10.1002/sia.6285
Publikováno v:
Surface and Interface Analysis. 49:1214-1224
We discuss analyses of trace levels of surface contamination using X-ray photoelectron spectroscopy (XPS). The problem of quantifying common sources of statistical and systematic uncertainties for these measurements is formulated in terms of the need
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df02915793d1489ce8409c6699b69963
https://doi.org/10.1002/sia.6289
https://doi.org/10.1002/sia.6289
Autor:
Shannon B. Hill, Nadir S. Faradzhev
Publikováno v:
Surface Science. 652:200-205
Previously we reported estimates of the maximum etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by a spatially-non-uniform beam of extreme ultraviolet (EUV) radiation at 13.5 nm (Faradzhev et al., 2013). Here we extend
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::605d17105cc9e22ec0f9a735972d51ce
https://doi.org/10.1016/j.susc.2016.03.025
https://doi.org/10.1016/j.susc.2016.03.025
Publikováno v:
Journal of Vacuum Science & Technology A. 38:063201
Carbon contamination induced by ultraviolet (UV) radiation affects precision optics in applications as diverse as semiconductor lithography and satellite observations of the Sun. Our previous experiments have shown that low-intensity UV-induced surfa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd78d5887827a597c4735b2ee09d1eea
https://doi.org/10.1116/6.0000437
https://doi.org/10.1116/6.0000437
Publikováno v:
The Journal of Physical Chemistry C. 117:23072-23081
We report the photodeposition of a carbonaceous layer grown on a TiO2 thin film by extreme ultraviolet (EUV)-induced chemistry of adsorbed n-tetradecane and the subsequent photo-oxidation of this film. Chemical analysis of the carbonaceous layer indi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c8781ba36aeb3389e34a76e8c524cb41
https://doi.org/10.1021/jp4091427
https://doi.org/10.1021/jp4091427
Autor:
Nadir S, Faradzhev, Shannon B, Hill
Publikováno v:
Surface science. 652
Previously we reported estimates of the maximum etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by a spatially-non-uniform beam of extreme ultraviolet (EUV) radiation at 13.5 nm (Faradzhev et al., 2013). Here we extend
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::e583f08b14fd45239392e7e50e011afe
https://pubmed.ncbi.nlm.nih.gov/27458322
https://pubmed.ncbi.nlm.nih.gov/27458322
Autor:
Thomas B. Lucatorto, B. V. Yakshinskii, Theodore E. Madey, Shannon B. Hill, Nadir S. Faradzhev
Publikováno v:
Bulletin of the Russian Academy of Sciences: Physics. 74:28-32
In this paper we discuss surface phenomena leading to contamination of multilayer optics designed for Extreme Ultraviolet (EUV) lithography. Experimental data supported by calculations indicate dramatic influence of resonance structure of EUV mirror
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c3b94f04202fcb42faed6a7893a43ce
https://doi.org/10.3103/s1062873810010089
https://doi.org/10.3103/s1062873810010089
Autor:
Jim Rodriguez, Gary Fournier, Shannon B. Hill, Steven E. Grantham, Michael D. Kriese, Yuriy Platonov, John J. Curry, Thomas B. Lucatorto, Charles S. Tarrio
Publikováno v:
SPIE Proceedings.
A critical component of high-performance EUV lithography source optics is the reflecting multilayer coating. The ideal multilayer will have both high reflectance and high stability to thermal load. Additionally the capping layers must provide resista
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9af964e6e936949f92edfbc67fcd7148
https://doi.org/10.1117/12.2085934
https://doi.org/10.1117/12.2085934