Zobrazeno 1 - 1
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pro vyhledávání: '"Shane M. Witsell"'
Publikováno v:
Journal of Vacuum Science & Technology A. 40
Thin films of Al2O3 are deposited using in situ ultraviolet (UV) light enhanced atomic layer deposition (ALD) with trimethylaluminum and H2O and compared to those deposited using traditional thermal ALD at low temperatures of 45 and 80 °C. Coexposin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::285ab17770a694e05bcca9e7e55e27b1
https://doi.org/10.1116/6.0001865
https://doi.org/10.1116/6.0001865
