Zobrazeno 1 - 10
of 106
pro vyhledávání: '"Shane A Catledge"'
Publikováno v:
Materials Research Express, Vol 8, Iss 4, p 046401 (2021)
We report bias enhanced nucleation and growth of boron-rich deposits through systematic study of the effect of a negative direct current substrate bias during microwave plasma chemical vapor deposition. The current flowing through a silicon substrate
Externí odkaz:
https://doaj.org/article/0457c2f8b8874bcabc8d72acc38e47e1
Autor:
Matthew C Phipps, William C Clem, Shane A Catledge, Yuanyuan Xu, Kristin M Hennessy, Vinoy Thomas, Michael J Jablonsky, Shafiul Chowdhury, Andrei V Stanishevsky, Yogesh K Vohra, Susan L Bellis
Publikováno v:
PLoS ONE, Vol 6, Iss 2, p e16813 (2011)
The performance of biomaterials designed for bone repair depends, in part, on the ability of the material to support the adhesion and survival of mesenchymal stem cells (MSCs). In this study, a nanofibrous bone-mimicking scaffold was electrospun from
Externí odkaz:
https://doaj.org/article/94e3fd863d22444784ca43d8b11a0b7e
Autor:
Deepa Kodali, Kallol Chakrabarty, Shane A. Catledge, Bria C. Storr, Vijaya K. Rangari, Paul A. Baker
Publikováno v:
Ceramics, Vol 4, Iss 20, Pp 257-264 (2021)
A novel approach is demonstrated for the synthesis of the high entropy transition metal boride (Ta, Mo, Hf, Zr, Ti)B2 using a single heating step enabled by microwave-induced plasma. The argon-rich plasma allows rapid boro-carbothermal reduction of a
Publikováno v:
Scientific Reports, Vol 10, Iss 1, Pp 1-7 (2020)
Scientific Reports
Scientific Reports
Density functional theory predictions have been combined with the microwave-plasma chemical vapor deposition technique to explore metastable synthesis of boron-rich boron-carbide materials. A thin film synthesis of high-hardness (up to 37 GPa) B50C2
Autor:
Ilias Bikmukhametov, William Gullion, Richard L. Martens, Gregory B. Thompson, Kallol Chakrabarty, Aaditya Rau, Paul A. Baker, Shane A. Catledge
Publikováno v:
Journal of Materials Research. 35:481-490
Microwave plasma chemical vapor deposition (MPCVD) was used to diffuse boron into tantalum using plasma initiated from a feedgas mixture containing hydrogen and diborane. The role of substrate temperature and substrate bias in influencing surface che
Autor:
Shane A. Catledge, Reim. A. Almotiri
Publikováno v:
Advanced Science, Engineering and Medicine. 11:394-400
Publikováno v:
AIP Advances. 12:085228
A microwave plasma chemical vapor deposition system was used to synthesize cubic boron nitride (cBN) coatings on diamond seeded silicon substrates using direct current (DC) bias. Effects of the argon (Ar) flow rate and bias voltage on the growth of t
Autor:
Bria Storr, Luke Moore, Kallol Chakrabarty, Zaheeruddin Mohammed, Vijaya Rangari, Cheng-Chien Chen, Shane A. Catledge
Publikováno v:
APL Materials. 10:061109
Microwave-induced plasma was used to anneal precursor powders containing five metal oxides with carbon and boron carbide as reducing agents, resulting in high entropy boride ceramics. Measurements of hardness, phase structure, and oxidation resistanc
Autor:
Paul A. Baker, Kallol Chakrabarty, Vineeth M. Vijayan, Shane A. Catledge, Cheng-Chien Chen, Wei-Chih Chen
Publikováno v:
Materials
Volume 13
Issue 16
Materials, Vol 13, Iss 3622, p 3622 (2020)
Volume 13
Issue 16
Materials, Vol 13, Iss 3622, p 3622 (2020)
Superhard boron-rich boron carbide coatings were deposited on silicon substrates by microwave plasma chemical vapor deposition (MPCVD) under controlled conditions, which led to either a disordered or crystalline structure, as measured by X-ray diffra
Autor:
Bernabe S. Tucker, Shane A. Catledge, Vineeth M. Vijayan, Yogesh K. Vohra, Patrick T. J. Hwang, Pratheek S. Bobba, Vinoy Thomas, Ho-Wook Jun
Publikováno v:
J Mater Chem B
We report a novel and facile organosilane plasma polymerization method designed to improve the surface characteristics of poly(tetrafluoroethylene) (PTFE). We hypothesized that the polymerized silane coating would provide an adhesive surface for endo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::edd79a21b8af21d09044813ad4ad5d1d
https://europepmc.org/articles/PMC7453349/
https://europepmc.org/articles/PMC7453349/