Zobrazeno 1 - 10
of 132
pro vyhledávání: '"Sham-Tsong Shiue"'
Publikováno v:
Thin Solid Films. 660:899-906
The effect of radio-frequency (rf) powers on the characteristics of carbon-titanium nanocomposite thin films (C-Ti films) prepared by reactive sputtering is investigated. The C-Ti films were prepared on n-type silicon (n-Si) wafers by reactive sputte
Publikováno v:
Thin Solid Films. 653:350-358
The carbon‑nickel nanocomposite thin films (C-Ni films) were deposited on n-type silicon (n-Si) wafers using reactive sputtering from a pure nickel target in methane/argon sputtering gas. Six kinds of C-Ni films were prepared with the rf power bein
Autor:
Sham-Tsong Shiue, Zih-Chen Hong
Publikováno v:
Thin Solid Films. 618:21-27
The amorphous nickel carbon ( a -NiC) thin film alloys were prepared on n -type silicon ( n- Si) wafers by reactive sputtering system, which was modified from the radio frequency-plasma enhanced chemical vapor deposition (rf-PECVD) by adding a sputte
Publikováno v:
Solar Energy Materials and Solar Cells. 137:185-192
The effect of the thin native silicon dioxide (SiO2) interfacial layer on the photovoltaic characteristics of gold/p-type amorphous boron carbon thin film alloy/silicon dioxide/n-type silicon/aluminum (Au/a-BC/SiO2/n-Si/Al) solar cells is investigate
Publikováno v:
IET Optoelectronics. 9:141-144
The viscoelastic behaviour of commercial polymeric coatings for optical fibres is measured at room temperature using dynamic mechanic analysis, and the relationship between strain and stress in polymeric coatings is obtained. The thermally induced vi
Publikováno v:
Thin Solid Films. 570:356-362
The effects of radio-frequency (rf) power on the properties of carbon thin films prepared by thermal chemical vapor deposition (CVD) enhanced with remote inductively-coupled-plasma (ICP) are investigated. Acetylene and nitrogen were used as the precu
Publikováno v:
Thin Solid Films. 556:544-551
The properties of carbon films prepared by thermal chemical vapor deposition (thermal CVD) using camphor are investigated. As the deposition temperature increases from 1098 to 1198 K, the deposition rate follows the Arrhenius law with activation ener
Publikováno v:
ECS Journal of Solid State Science and Technology. 3:M45-M53
This study investigates the correlation between thermal chemical vapor deposition kinetics and characteristics of smooth laminar carbon films using propane/ammonia (C3H8/NH3) mixtures. During the deposition process, a residual gas analyzer is used to
Publikováno v:
Journal of Applied Physics; Sep2010, Vol. 108 Issue 5, p053519-35194, 4p, 1 Diagram, 6 Graphs
Publikováno v:
Journal of Applied Physics; 9/1/2004, Vol. 96 Issue 5, p2494-2500, 7p, 4 Graphs