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pro vyhledávání: '"Shahad Khudiar"'
Publikováno v:
Journal of Applied Sciences and Nanotechnology, Vol 2, Iss 2, Pp 64-69 (2022)
Photoelectrochemical etching (PECE) was used to prepare porous silicon (PS) layers of polished surfaces of (100) n-type silicon wafers with a resistance of 0.1-100 μm and thickness of 600 ± 25 μm. The directed slices are to be catalyzed at differe
Externí odkaz:
https://doaj.org/article/2e5997dbf9084f298c77f5eef8029743