Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Seva Khikhlovskyi"'
Autor:
Woong Jae Chung, Blandine Minghetti, Rajan Mali, Gregory Hart, Pavan Samudrala, Nyan Aung, Lokesh Subramany, Haiyong Gao, Seva Khikhlovskyi, Pieter Heres, Yen-Jen Chen
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Wafers at FBEOL layers traditionally have higher stress and larger alignment signal variability. ASML's ATHENA sensor based scanners, commonly used to expose FBEOL layers, have large spot size (∼700um). Hence ATHENA captures the signal from larger
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c38a81b2ec54b9497c883479b762ec3
https://doi.org/10.1109/asmc.2018.8373194
https://doi.org/10.1109/asmc.2018.8373194
Autor:
Nyan Aung, Pavan Samudrala, Gregory Hart, Woong Jae Chung, Blandine Minghetti, Haiyong Gao, Seva Khikhlovskyi, Yen-Jen Chen, Rajan Mali, Lokesh Subramany, Pieter Heres
Publikováno v:
SPIE Proceedings.
Wafers at FBEOL layers traditionally have higher stress and larger alignment signal variability. ASML’s ATHENA sensor based scanners, commonly used to expose FBEOL layers, have large spot size (~700um). Hence ATHENA captures the signal from larger
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec6351baa873c6a59be4d740fe50e4a3
https://doi.org/10.1117/12.2258128
https://doi.org/10.1117/12.2258128