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Autor:
Seungheon Na, Jaekwang Kim, Kushlendra Mishra, Kiwook Park, Peter Buck, Inpyo Kim, Rachit Sharma, Ingo Bork, Dongeun Cha
Publikováno v:
Photomask Technology 2021.
Model-based Mask Process Correction (MPC) is an indispensable data processing step for producing masks for advanced wafer production nodes. Typically, calibration of an MPC model may require several thousands SEM measurements. However, due to metrolo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5062d088cb0f56b7076240faa31e5091
https://doi.org/10.1117/12.2600926
https://doi.org/10.1117/12.2600926
