Zobrazeno 1 - 7
of 7
pro vyhledávání: '"SeungHwa Oh"'
Publikováno v:
Optics express. 30(16)
The effect of deep subwavelength disorder in one-dimensional dichromic multilayer films on the optical transmission, localization length, and Goos–Hänchen shift around the critical angle is analyzed using sets of disordered multilayer films with d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7804a92973540f99b8c23fc6eea021c0
https://pubmed.ncbi.nlm.nih.gov/36299029
https://pubmed.ncbi.nlm.nih.gov/36299029
Publikováno v:
Journal of Mechanical Science and Technology. 35:3199-3209
We propose the recursive inverse kinematics (RIK) algorithm to compute joint angles of a humanoid robot using skeleton tracking data. Recursive inverse kinematics calculates the angles recursively from the base body (torso) to the tree-end body (hand
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec1690b562d8bb3c70667ff2d7e2f0ec
https://doi.org/10.1007/s12206-021-0640-y
https://doi.org/10.1007/s12206-021-0640-y
Publikováno v:
2020 20th International Conference on Control, Automation and Systems (ICCAS).
Teaching human motion to a humanoid social robot is important because it enables a humanoid social robot to interact with humans more naturally and in a friendly manner. Recently, a depth camera-based human motion teaching has been developed. However
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::962b4f0079c6c319d2667d9775b6f3fa
https://doi.org/10.23919/iccas50221.2020.9268277
https://doi.org/10.23919/iccas50221.2020.9268277
Autor:
SeungHwa Oh, Mohamed El Kodadi, Seung Yoon Lee, Daniel Park, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Chan Hwang, Jeonghyun Park
Publikováno v:
Optical Microlithography XXXI.
All wafers moving through a microchip nanofabrication process pass through a lithographic apparatus for most, if not all, layers. With a lithographic apparatus providing a massive amount of data per wafer, this paper will outline how physicsbased mod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7404ac1de63831bc7ee1cb6ff73531d2
https://doi.org/10.1117/12.2297513
https://doi.org/10.1117/12.2297513
Autor:
Marc Noot, Elliott McNamara, Chan Hwang, Kaustuve Bhattacharyya, Seung Yoon Lee, Frank van de Mast, Nang-Lyeom Oh, Se-Ra Jeon, Joost van Heijst, Noh-Kyoung Park, Arie Jeffrey Den Boef, Kun-tack Lee, Kevin An, SeungHwa Oh, Greet Storms
Publikováno v:
SPIE Proceedings.
With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::efd0e3530c1f43ec58e9259ce2f607b1
https://doi.org/10.1117/12.2222040
https://doi.org/10.1117/12.2222040
Autor:
Chan Hwang, Seung Yoon Lee, SeungHwa Oh, Schmitt-Weaver, Emil, Jeonghyun Park, Park, Daniel, El Kodadi, Mohamed, Bhattacharyya, Kaustuve
Publikováno v:
Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-7, 7p
Autor:
E. S. Jung, Jeongjin Lee, Seung-yoon Lee, Chan Hwang, SeungHwa Oh, Gil-heyun Choi, Ho-Kyu Kang
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
In this paper, set of wafers with separated processes was prepared and overlay measurement result was compared in two methods; IBO and DBO. Based on the experimental result, theoretical approach of relationship between overlay mark deformation and ov
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::951232ee1421b288272407b5cc049323
https://doi.org/10.1117/12.2046583
https://doi.org/10.1117/12.2046583