Zobrazeno 1 - 10
of 46
pro vyhledávání: '"Seung-Hune Yang"'
Autor:
Jeeyong Lee, Yangwoo Heo, Ryanggeun Lee, Sangwook Kim, Ji-Suk Hong, Kyoil Koo, Changmook Yim, Jungmin Kim, Sooyong Lee, Joonsung Kim, Dongho Kim, Seung-Hune Yang, Seongtae Jeong
Publikováno v:
Advanced Etch Technology and Process Integration for Nanopatterning XII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3117f2c2d9e18ea6182ce9c8ca23d2d
https://doi.org/10.1117/12.2657880
https://doi.org/10.1117/12.2657880
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c6564e03f395e2d45a390c6bbbad064
https://doi.org/10.1117/12.2658321
https://doi.org/10.1117/12.2658321
Autor:
Park Seong-Yul, Sooryong Lee, Kareem Madkour, Joe Kwan, Ho-Kyu Kang, Seung-Hune Yang, Joong-Won Jeon, SeungJo Lee, Jaewan Song, Wael ElManhawy, Jeong-Lim Kim
Publikováno v:
SPIE Proceedings.
Due to limited availability of DRC clean patterns during the process and RET recipe development, OPC recipes are not tested with high pattern coverage. Various kinds of pattern can help OPC engineer to detect sensitive patterns to lithographic effect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbe03e1331cf338d750fc4c3b7d06483
https://doi.org/10.1117/12.2257830
https://doi.org/10.1117/12.2257830
Publikováno v:
Journal of Modern Optics. 57:783-797
A technique for obtaining native (uncrossed illumination/image polarizations) and induced (crossed illumination/image polarization) using a significant amount of evanescent energy is described for a solid immersion lens (SIL) microscope. Characterist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d929466c2877d54bfad264c12fcb7964
https://doi.org/10.1080/09500341003660531
https://doi.org/10.1080/09500341003660531
Publikováno v:
Alternative Lithographic Technologies VII.
Verification of full-chip DSA guide patterns (GPs) through simulations is not practical due to long runtime. We develop a decision function (or functions), which receives n geometry parameters of a GP as inputs and predicts whether the GP faithfully
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9eaa617de146873e3a7de60b4b5b562e
https://doi.org/10.1117/12.2085644
https://doi.org/10.1117/12.2085644
Publikováno v:
Microelectronics Reliability. 46:1904-1909
Wire ball open failure at the interface of the gold wire and bonding pad of a multi-stack package (MSP) under high temperature storage (HTS) condition of 150 °C is studied. Failure analysis using FIB-SEM was conducted by in-plane moire interferometr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5d1d1c35f3fa7ed44f79ddbb947c070c
https://doi.org/10.1016/j.microrel.2006.07.089
https://doi.org/10.1016/j.microrel.2006.07.089
Publikováno v:
SPIE Proceedings.
Advances on techniques that enable small technology nodes printing benefit the lithography with cost. For instance, lens heating draws people's attention when the NTD process is applied together with the bright tone mask. And the study of it requires
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::255b1afd33aa171f6c7b71750d4b253a
https://doi.org/10.1117/12.2045366
https://doi.org/10.1117/12.2045366
Autor:
Kyoil Koo, Gyengseop Kim, Jung-Dal Choi, Seung-Hune Yang, Ho-Kyu Kang, Sang-hun Kim, Sooryong Lee, Young-Chang Kim
Publikováno v:
SPIE Proceedings.
Most important factors in OPC model building will be sampling data for model calibration. We will demonstrate that how CD-AFM data can be used in OPC modeling and will show possibility to get a more predictive model by using CD-AFM data.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::427a18453ed61489b4f54e28303d7c7c
https://doi.org/10.1117/12.2025552
https://doi.org/10.1117/12.2025552
Autor:
Seongbo Shim, Ningning Jia, Ho-Kyu Kang, Jung-Dal Choi, Seung-Hune Yang, Young-Chang Kim, Dmitry Vengertsev
Publikováno v:
SPIE Proceedings.
More complex source and mask shapes are required to maximize the process window in low κ1 era. In simulation, the improvement can be shown well with ideal source and mask shapes. However imperfection of the source and mask can cause critical dimensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83bcf652b426746c6554705b4e0fdc36
https://doi.org/10.1117/12.2011993
https://doi.org/10.1117/12.2011993
Autor:
Seung-Hune Yang, Dmitry Vengertsev, Jung-Dal Choi, Ki-Hyun Kim, Sooryong Lee, Seongbo Shim, Artem Shamsuarov, Seong-Woon Choi, Ho-Kyu Kang, Seongho Moon
Publikováno v:
SPIE Proceedings.
Model-based Optical Proximity Correction (OPC) is widely used in advanced lithography processes. The OPC model contains an empirical part, which is calibrated by fitting the model with data from test patterns. Therefore, the success of the OPC model
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0bce54354637fc28ac3ec290f30d552d
https://doi.org/10.1117/12.953827
https://doi.org/10.1117/12.953827