Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Seung H. Chae"'
Publikováno v:
Journal of Electronic Materials. 47:855-865
This paper reports experimental observations evidencing that the intermetallic compound phase interfaced with Cu in the Al-Cu diffusion couple is most likely α2-Cu3Al phase, not γ-Cu9Al4 phase as previously assumed, and that its growth to a critica