Zobrazeno 1 - 10
of 35
pro vyhledávání: '"Seulgi, Choi"'
Autor:
Kubra Aydin, Seongwon Woo, Vinit Kaluram Kanade, Seulgi Choi, Chisung Ahn, Byungkwon Lim, Taesung Kim
Publikováno v:
Carbon Energy, Vol 5, Iss 11, Pp n/a-n/a (2023)
Abstract Herein, a layer of molybdenum oxide (MoOx), a transition metal oxide (TMO), which has outstanding catalytic properties in combination with a carbon‐based thin film, is modified to improve the hydrogen production performance and protect the
Externí odkaz:
https://doaj.org/article/9f23c58989cb43ed87b1b23fb156c4a4
Publikováno v:
Journal of the Korean Neurological Association. 40:315-318
Cephalosporin is widely used in clinical practice due to its broad anti-bacterial activity. However, some serious side effects have been reported. Here, we report a 79-year-old male who repeatedly experienced toxic encephalopathy after consecutive ad
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::611f219fea2ba7f585ff207a58c976f7
https://doi.org/10.17340/jkna.2022.4.5
https://doi.org/10.17340/jkna.2022.4.5
Autor:
Seulgi Choi
Publikováno v:
The Korean Archaeological Society. 2022:691-719
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25edf29cc10f3fb6585ba057c2651f94
https://doi.org/10.47439/jkras.2022.3.691
https://doi.org/10.47439/jkras.2022.3.691
Publikováno v:
Journal of Industrial and Engineering Chemistry. 107:207-214
Chemical mechanical polishing (CMP), a wafer surface planarization method, is critical in the semiconductor industry because uniform and scratch-free processing is required for a highly integrated circuit on the wafer surface. Thus, the prediction of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::539b458bca7b2b1344b5a28d46bbcc72
https://doi.org/10.1016/j.jiec.2021.11.049
https://doi.org/10.1016/j.jiec.2021.11.049
Publikováno v:
Journal of KIISE. 48:1335-1342
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbc01064c70d263721f500301dbad69d
https://doi.org/10.5626/jok.2021.48.12.1335
https://doi.org/10.5626/jok.2021.48.12.1335
Publikováno v:
Computers, informatics, nursing : CIN. 40(7)
Although the human papillomavirus vaccine is efficacious, 40% of 13-year-old adolescents have been vaccinated for human papillomavirus. Implementing theory-based, user-centered applications can address this suboptimal coverage. This formative usabili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3de88b9428ea29f0e4fbb4ec3777d9a1
https://pubmed.ncbi.nlm.nih.gov/35797614
https://pubmed.ncbi.nlm.nih.gov/35797614
Autor:
Sumin Lim, Seulgi Choi, Ju-Kyung Lee, Eunhyun Choi, Sungwon Lee, Kwangwoo Chun, Myoungki Baek, Jiyeon Park, Jihyun Kim, Areum Kang, Younghoon Kim, Namkyoung Kim, Byoungchul Cho, Taebo Sim, Koo Lee
Publikováno v:
Cancer Research. 83:4006-4006
Targeting mutated EGFR is a clinically validated approach for tackling non-small cell lung cancer (NSCLC). Approximately 20% of patients with advanced NSCLC harbor an EGFR mutation. Osimertinib is a 3rd-generation oral EGFR-TKI targeting the EGFR sen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15f72a6186ee7bbaf4d96c8c17ef062d
https://doi.org/10.1158/1538-7445.am2023-4006
https://doi.org/10.1158/1538-7445.am2023-4006
Publikováno v:
The Review of scientific instruments. 92(11)
A study of the uniform deposition of nanoparticles across a 300-mm wafer was conducted to assess the uniformity of the wafer center-to-edge cleaning technique. A new method of particle deposition was devised different from the conventional method usi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::0e5fe8c848b7c336e12cce5d8f7b590d
https://pubmed.ncbi.nlm.nih.gov/34852556
https://pubmed.ncbi.nlm.nih.gov/34852556
Autor:
Seulgi Choi1, HyeLim Park1, SeoYeon Jung1, Jae-Hwan Nam1, Eun-Kyung Kim2, Mi-La Cho2, Jun-Ki Min3, Su-Jin Moon3, Sang-Myeong Lee4, Jang-Hee Cho5, Dong-Hee Lee5
Publikováno v:
International Journal of Molecular Sciences. Sep2017, Vol. 18 Issue 9, p1976. 18p. 4 Diagrams, 1 Chart, 6 Graphs.
Publikováno v:
Review of Scientific Instruments. 92:113704
A study of the uniform deposition of nanoparticles across a 300-mm wafer was conducted to assess the uniformity of the wafer center-to-edge cleaning technique. A new method of particle deposition was devised different from the conventional method usi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f093a11b981c02cd868d41c61806008
https://doi.org/10.1063/5.0067262
https://doi.org/10.1063/5.0067262