Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Sethuraman Jayashankar"'
Autor:
Sriram Viswanathan, Thomas Roy Boonstra, Dongsung Hong, Harold Gentile, Dion Song, Carolyn Pitcher Van Dorn, Dexin Wang, Lily Horng Youtt, Sethuraman Jayashankar, S. H. Gee, Daniel Sullivan, Mark T. Kief
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 12:031105
The lithographic requirements for the thin film head (TFH) industry are comparable to the semiconductor industry for certain parameters such as resolution and pattern repeatability. In other aspects such as throughput and defectivity, the requirement
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::18712ec813dc730f416301a066e6157c
https://doi.org/10.1117/1.jmm.12.3.031105
https://doi.org/10.1117/1.jmm.12.3.031105
