Výsledky vyhledávání - "Serap A. Savari"

Increasing the Utilization of Deep Neural Networks for SEM Measurements Through Multiple Task Formulation and Visualization

Autor: Narendra Chaudhary, Serap A. Savari

Publikováno v: IEEE Transactions on Semiconductor Manufacturing. 33:322-330

Scanning electron microscopy images are an attractive option to estimate the roughness of nanostructures. Convolutional neural network (CNN) based algorithms have improved scanning electron microscope (SEM) image denoising and estimation of line roug

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::47fc9620cb571aee42d7c8f14baab5a5
https://doi.org/10.1109/tsm.2020.2979680

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On Uses of Noise Analysis for the Uncertainty Quantification of Line Edge Roughness Estimation

Autor: Inimfon I. Akpabio, Serap A. Savari

Publikováno v: IEEE Transactions on Semiconductor Manufacturing. :1-1

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::110ca29e7f21b0551aef711df0fdf017
https://doi.org/10.1109/tsm.2023.3270230

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Uncertainty quantification of machine learning models: on conformal prediction

Autor: Serap A. Savari, Inimfon I. Akpabio

Publikováno v: Photomask Technology 2021.

Background: Machine learning is predicted to have an increasingly important role in semiconductor metrology. Prediction intervals that describe the reliability of the predictive performance of machine learning models are important to guide decision m

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::df545838fd2f7e2768f2856ede5e1586
https://doi.org/10.1117/12.2600838

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SEM Image Denoising and Contour Image Estimation using Deep Learning

Autor: Narendra Chaudhary, Varvara Brackmann, Michael Friedrich, Serap A. Savari

Publikováno v: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

The estimation of line and contour geometries from real SEM images is a challenging problem due to the corruption of such images by Poisson noise, edge effects, and other SEM artifacts. We attempt simultaneous contour edge image prediction and SEM im

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e8565ef1914c7b147ece1443d37f47f2
https://doi.org/10.1109/asmc49169.2020.9185250

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Towards a visualization of deep neural networks for rough line images

Autor: Serap A. Savari, Narendra Chaudhary

Publikováno v: 35th European Mask and Lithography Conference (EMLC 2019).

Low dose scanning electron microscope (SEM) images are an attractive option to estimate the roughness of nanos- tructures. We recently proposed two deep convolutional neural network (CNN) architectures named “LineNet” to simultaneously perform de

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::690054fca33d2bd5fef8ff4cc17c2a6a
https://doi.org/10.1117/12.2535667

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Simultaneous Denoising and Edge Estimation from SEM Images using Deep Convolutional Neural Networks

Autor: Narendra Chaudhary, Serap A. Savari

Publikováno v: 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

We propose deep convolutional neural networks LineNet1 and LineNet2 for simultaneous denoising and edge image prediction from low-dose scanning electron microscope images. Edge estimation of nanostructures from SEM images is needed for line edge roug

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::06c3bb7e26bb3b2c5473b613519d1105
https://doi.org/10.1109/asmc.2019.8791764

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Automated rough line-edge estimation from SEM images using deep convolutional neural networks

Autor: Narendra Chaudhary, Sai Swaroop Yeddulapalli, Serap A. Savari

Publikováno v: Photomask Technology 2018.

We propose a deep convolutional neural network named EDGENet to estimate rough line edge positions in low-dose scanning electron microscope (SEM) images corrupted by Poisson noise, Gaussian blur, edge effects and other instrument errors and apply our

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0d4686ed8980e3518cd42f20ed2b253b
https://doi.org/10.1117/12.2501723

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Deep supervised learning to estimate true rough line images from SEM images

Autor: Narendra Chaudhary, Sai Swaroop Yeddulapalli, Serap A. Savari

Publikováno v: 34th European Mask and Lithography Conference.

We use deep supervised learning for the Poisson denoising of low-dose scanning electron microscope (SEM) images as a step in the estimation of line edge roughness (LER) and line width roughness (LWR). Our denoising algorithm applies a deep convolutio

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7a0b0667a21e32479a3dfaeb19b5ec51
https://doi.org/10.1117/12.2324341

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A parallel multibeam mask writing method and its impact on data volumes

Autor: Serap A. Savari, Narendra Chaudhary, Yao Luo

Publikováno v: 32nd European Mask and Lithography Conference.

The pattern requirements for mask writers have steadily been growing, and there is considerable interest in multibeam mask writers to handle the throughput and resolution challenges associated with the needs of sub- 10nm technology nodes. The mask wr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8a3e140338fa519550f0acf1423ca157
https://doi.org/10.1117/12.2248449

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