Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Seongchul Hong"'
Autor:
DANBEE SHIN, DOOHYOUN SEO, TAEHUN KIM, KWANGWON RHIE, DONGMIN LEE, HYOUNGI KIM, SEONGCHUL HONG
Publikováno v:
Transactions of the Korean Hydrogen and New Energy Society. 33:61-66
Publikováno v:
Korean Journal of Metals and Materials. 55:139-143
Publikováno v:
Nanoscience and Nanotechnology Letters. 8:739-743
Publikováno v:
Nanoscience and Nanotechnology Letters. 8:729-733
Autor:
Chul Shin, Jinho Ahn, Jung Sic Kim, Dong Gon Woo, Seongchul Hong, Jong-Hwa Lee, Chul Kyu Yang
Publikováno v:
Korean Journal of Metals and Materials. 54:546-551
Publikováno v:
Nanoscience and Nanotechnology Letters. 8:544-548
Publikováno v:
Nanoscience and Nanotechnology Letters. 8:615-619
This work was supported by the Basic Science Research Program through a National Research Foundation of Korea (NRF) grant funded by Korea government (MEST) (grant no. 2011-0028570).
Publikováno v:
Korean Journal of Metals and Materials. 54:379-385
Publikováno v:
Korean Journal of Metals and Materials. 55
Publikováno v:
Journal of nanoscience and nanotechnology. 15(11)
In addition to the development of extreme ultraviolet lithography (EUVL), studies on beyond extreme ultraviolet lithography (BEUVL), which uses radiation with a wavelength of 6.7 nm, are in progress for their application in high-volume manufacturing.