Zobrazeno 1 - 10
of 103
pro vyhledávání: '"Seong-Woon Choi"'
Publikováno v:
Journal of Clinical Medicine, Vol 10, Iss 2179, p 2179 (2021)
Journal of Clinical Medicine
Volume 10
Issue 10
Journal of Clinical Medicine
Volume 10
Issue 10
Background: Papillary thyroid cancer (PTC) has the highest cancer incidence in Korea. It is known that some thyroid cancers have aggressive clinical behavior and a poor prognosis. Genomic studies have described some somatic mutations that are related
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b1db4e25634f94fdf68009a80aea2f67
https://www.mdpi.com/2077-0383/10/10/2179
https://www.mdpi.com/2077-0383/10/10/2179
Publikováno v:
Annals of Hepato-Biliary-Pancreatic Surgery
Backgrounds/Aims: The aim of this study was to identify the risk factors of the development of large amounts of ascites (LA) after hepatic resection for hepatocellular carcinoma (HCC). Methods: The medical records of 137 consecutive patients who unde
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2164b115e4a758fd8a3f949405bb3fdd
http://europepmc.org/articles/PMC5325146
http://europepmc.org/articles/PMC5325146
Publikováno v:
Journal of Endocrine Surgery. 20:69
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ac5ae2bc0ab8ab69d380bcffba75703
https://doi.org/10.16956/jes.2020.20.4.69
https://doi.org/10.16956/jes.2020.20.4.69
Autor:
Bong Hoon Kim, Sang Chul Jeon, Seok-Hwan Oh, Seung Hak Park, Kyoung-seon Kim, Si Yong Lee, Dong Ki Yoon, Sang Ouk Kim, Dong Ok Shin, Seong-Woon Choi
Publikováno v:
Soft Matter. 6:120-125
We present block copolymer multiple patterning as an efficient and truly scalable nanolithography for sub-20 nm scale patterning, synergistically integrated with conventional ArF lithography. The directed assembly of block copolymers on chemically pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8887630c050df6b9d1b38ccc68498914
https://doi.org/10.1039/b913853f
https://doi.org/10.1039/b913853f
Publikováno v:
Microelectronic Engineering. 53:287-290
Multiple scattering effect is discussed with a low voltage e-beam system. A test layout is designed to figure out the multiple scattering effect. A dark erosion is studied to identify the scattering range. The range is found to be as far as ~15mm wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9df563b1f1913fde98af0375126cdb2a
https://doi.org/10.1016/s0167-9317(00)00316-6
https://doi.org/10.1016/s0167-9317(00)00316-6
Autor:
Seung-Hune Yang, Dmitry Vengertsev, Jung-Dal Choi, Ki-Hyun Kim, Sooryong Lee, Seongbo Shim, Artem Shamsuarov, Seong-Woon Choi, Ho-Kyu Kang, Seongho Moon
Publikováno v:
SPIE Proceedings.
Model-based Optical Proximity Correction (OPC) is widely used in advanced lithography processes. The OPC model contains an empirical part, which is calibrated by fitting the model with data from test patterns. Therefore, the success of the OPC model
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0bce54354637fc28ac3ec290f30d552d
https://doi.org/10.1117/12.953827
https://doi.org/10.1117/12.953827
Publikováno v:
SPIE Proceedings.
A negative tone development (NTD) process has been considered as apromising candidate for the smaller contact solution due to the remarkable image quality over a positive tone develop (PTD) process. However, it has not been investigated why NTD has h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51efd0eede406352f73f1987658b8e1d
https://doi.org/10.1117/12.915931
https://doi.org/10.1117/12.915931
Autor:
Thomas Schmöller, Young-Chang Kim, Bernd Küchler, John Lewellen, Seung-Hune Yang, Eun-Ju Kim, Chang-Jin Kang, Seongho Moon, Ulrich Klostermann, Junghoon Ser, Sooryong Lee, Seong-Woon Choi, Artem Shamsuarov
Publikováno v:
SPIE Proceedings.
In this paper, we discuss the accuracy of resist model calibration under various aspects. The study is done based on an extensive OPC dataset including hundreds of CD values obtained with immersion lithography for the sub-30 nm node. We address imagi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81a6de21215b4f60a91dd30d41b71359
https://doi.org/10.1117/12.879592
https://doi.org/10.1117/12.879592
Autor:
Tom Cecil, Chang-Jin Kang, Hyun-Jong Lee, Junghoon Ser, Christopher Ashton, David Kim, Xin Zhou, Guangming Xiao, Sung-Gon Jung, Donghwan Son, Seong-Woon Choi, Woojoo Sim, David Irby, Sungsoo Suh
Publikováno v:
SPIE Proceedings.
For low k1 lithography the resolution of critical patterns on large designs can require advanced resolution enhancement techniques for masks including scattering bars, complicated mask edge segmentation and placement, etc. Often only a portion of a l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c2f1852604ae07340417cb0b44e040f
https://doi.org/10.1117/12.879781
https://doi.org/10.1117/12.879781
Autor:
Sooryoung Lee, Seongbo Shim, Seong-Woon Choi, Young-Hee Kim, Seongho Moon, Munhoe Do, Ulrich Klostermann, Bernd Küchler, Young-Chang Kim
Publikováno v:
SPIE Proceedings.
In this paper, we introduce a rigorous OPC technology that links the physical lithography simulation with the OPC. Firstly, the various aspects of the rigorous OPC, related to process flow, are discussed and the practical feasibility of the embedded
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff86e1c45ed8f528a6491579d5c96ef9
https://doi.org/10.1117/12.879577
https://doi.org/10.1117/12.879577