Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Seong-Wook Yoo"'
Publikováno v:
IEEE Photonics Technology Letters. 31:1183-1186
We present a silicon nitride (SixNy) arrayed waveguide grating (AWG). Crosstalk in this AWG was reduced by decreasing the phase error in a multimode arrayed waveguide (WG) at center wavelength of 838 nm. 8-channel SixNy AWGs using arrayed WGs with do
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a689edc6b66357dc5cac32ca076b043
https://doi.org/10.1109/lpt.2019.2922425
https://doi.org/10.1109/lpt.2019.2922425
Publikováno v:
Journal of the Korean Physical Society. 71:150-155
The effect of N2O direct oxidation processes with re-oxidation on SiC/SiO2 interface characteristics has been investigated. With different oxidation and post oxidation annealing (POA) processes, the flat-band voltage, effective dielectric charge dens
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e57c8c3b7333eaf1c8d8db948e1e8a18
https://doi.org/10.3938/jkps.71.150
https://doi.org/10.3938/jkps.71.150
Autor:
Jinho Lee, Kyoung Il Na, Jin Gun Koo, Jong-Il Won, Sang Hoon Chai, Sang Gi Kim, Seong Wook Yoo, Hyung-Moo Park, Yil Suk Yang, Hoon Soo Park
Publikováno v:
ETRI Journal. 35:632-637
In this paper, we propose a superjunction trench gate MOSFET (SJ TGMOSFET) fabricated through a simple p-pillar forming process using deep trench and boron silicate glass doping process technology to reduce the process complexity. Throughout the vari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fa7348d1ee3bc49d510cd1b068f7b28
https://doi.org/10.4218/etrij.13.1912.0012
https://doi.org/10.4218/etrij.13.1912.0012
Autor:
Bo-Woo Kim, Yong-Sun Yoon, Seong-Wook Yoo, Kun-Sik Park, Jong-Moon Park, Kwangsoo No, Tae Woo Kim, J. Kosonen, Jin-Yeong Kang, Chang-Joo Yoon
Publikováno v:
Journal of the Korean Physical Society. 53:2185-2191
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::640f7096c360444206c63c736ab796a1
https://doi.org/10.3938/jkps.53.2185
https://doi.org/10.3938/jkps.53.2185
Autor:
Jong-Moon Park, Sung-Ku Kwon, In-Kyu You, Kwang-Ho Kwon, Kun-Sik Park, Bo-Woo Kim, Seong Wook Yoo, Byungwhan Kim
Publikováno v:
Thin Solid Films. 426:8-15
An oxide film etched in a magnetically-enhanced CHF3/CF4 plasma has been modeled using neural networks. The etch process was characterized with a 24−1 factorial experiment. The experimental factors and ranges include 20–80 sccm CHF3 flow rate, 10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f455831097e7305e95d7ab9dd8ce326
https://doi.org/10.1016/s0040-6090(02)01114-8
https://doi.org/10.1016/s0040-6090(02)01114-8
Autor:
Jong Moon Park Park, Kun Sik Park Park, Byung Whan Kim Kim, Yoon Kyu Kyu, Seong Wook Yoo, Kwang Ho Kwon Kwon, Sung Ku Kwon Kwon
Publikováno v:
ETRI Journal. 24:211-220
This study characterizes an oxide etching process in a magnetically enhanced reactive ion etching (MERIE) reactor with a CHF 3 /CF 4 gas chemistry. We use a statistical 2 4-1 experimental design plus one center point to characterize the relationships
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f6b4542e8eca8f6cea99feaeb7434cd
https://doi.org/10.4218/etrij.02.0102.0305
https://doi.org/10.4218/etrij.02.0102.0305
Publikováno v:
Extended Abstracts of the 2005 International Conference on Solid State Devices and Materials.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ff5a4eecd35224aefaceeb9004b44f8
https://doi.org/10.7567/ssdm.2005.p6-10
https://doi.org/10.7567/ssdm.2005.p6-10
Publikováno v:
Toxins, Vol 14, Iss 7, p 462 (2022)
Botulinum neurotoxin injections near the lateral canthal rhytids are commonly used in cosmetic settings; however, there is a lack of thorough anatomical knowledge, and an effective way to treat them with accumulating knowledge is needed. The anatomic
Externí odkaz:
https://doaj.org/article/46755210c7064a99b625f2d6b6dc6e0a
Autor:
Kun-Sik Park, Sung-Ku Kwon, Kwang-Ho Kwon, Jong-Moon Park, Byungwhan Kim, Seong Wook Yoo, Bo-Woo Kim
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:2113
Oxide films etched in a CHF3/CF4 plasma were qualitatively modeled using neural networks. The etching was conducted using a magnetically enhanced reactive ion etcher. A statistical 24-1 experimental design plus one center point was used to characteri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c6ca77729ea9cd06ab30a63a6a88215
https://doi.org/10.1116/1.1511212
https://doi.org/10.1116/1.1511212
Autor:
Sang Gi Kim, Hoon Soo Park, Kyoung ll Na, Seong Wook Yoo, Jongil Won, Jin Gun Koo, Sang Hoon Chai, Hyung-Moo Park, Yil Suk Yang, Jin Ho Lee
Publikováno v:
ETRI Journal; Aug2013, Vol. 35 Issue 4, p632-637, 6p