Zobrazeno 1 - 10
of 123
pro vyhledávání: '"Seong Jun Jeong"'
Autor:
Seong-Jun Jeong, Dong-Beom Choi
Publikováno v:
Korean Journal of Financial Studies. 51:417-445
Criticism of conventional shareholder supremacy triggered urges for incorporating the stakeholder perspective and the Environmental(E), Social(S) and Governance(G) issues in managerial decisions. However, the corporations in Korea still lack proper c
Publikováno v:
Transactions of the KSME C Industrial Technology and Innovation. 9:61-66
Autor:
Seongjun Park, Hyangsook Lee, Hyeon-Jin Shin, Dongwook Lee, Keun Wook Shin, Seong-Jun Jeong, Hyun-Mi Kim, Ki-Bum Kim, Jae Gwan Chung, Sangwon Kim, Yeonchoo Cho, Minsu Seol
Publikováno v:
ACS Applied Nano Materials. 3:4635-4641
As the feature size of semiconductor devices decreases, the resist layer with high etch resistance is required to achieve fine pattern transfer during lithography. Conventional resists (e.g., amorp...
Autor:
Byeong Gyu Roh, Hun Hoe Heo, Seung Chul Park, Ji Ho Baek, Sung Gap Im, Ji Hye Kim, Seong Jun Jeong, Hyung Sang Park
Publikováno v:
Proceedings of the International Display Workshops. :438
Autor:
Jaeup U. Kim, Daeseong Yong, Kyu Hyo Han, Seung Keun Cha, Jang Hwan Kim, Seong-Jun Jeong, Hyeong Min Jin, Geon Gug Yang, Sang Ouk Kim
Publikováno v:
ACS Applied Materials & Interfaces. 11:20265-20271
A nanosquare array is an indispensable element for the integrated circuit design of electronic devices. Block copolymer (BCP) lithography, a promising bottom-up approach for sub-10 nm patterning, has revealed a generic difficulty in the production of
Autor:
Seongjun Park, Changmin Lee, Mirine Leem, Seongjae Park, Seong-Jun Jeong, Hyangsook Lee, Wonsik Ahn, Eunha Lee, Hoijoon Kim, Taejin Park, Yunseok Kim, Hyoungsub Kim
Publikováno v:
Thin Solid Films. 673:112-118
For the fabrication of high-performance top-gated MoS2 transistors, a uniform atomic layer deposition (ALD) of an ultrathin high-k gate dielectric film without abnormal leakage paths on a MoS2 channel is required. In this study, we fabricated a ~5.2
Autor:
Hyeong Min Jin, Young-Gi Lee, Seung Keun Cha, Dong Ok Shin, Jin Young Choi, Jun Soo Kim, Suwan Jeon, Jonghwa Shin, Seong-Jun Jeong, Geon Gug Yang, Sang Ouk Kim, Jang Hwan Kim, Taeyong Chang, Ju Young Kim, Bong Hoon Kim, Kwang Man Kim
Publikováno v:
Nanoscale. 10:100-108
Transparent conducting electrodes (TCEs) are essential components in various optoelectronic devices. Nanostructured metallic thin film is one of the promising candidates to complement current metal oxide films, such as ITO, where high cost rare earth
Autor:
Jeong Ho Mun, Seong-Jun Jeong, Hyeong Min Jin, Seung Keun Cha, Jun Soo Kim, Sang Ouk Kim, Chang Yun Moon, Kwang Ho Kim, Gil Yong Lee
Publikováno v:
ACS Applied Materials & Interfaces. 9:15727-15732
We introduce a facile and effective fabrication of complex multimetallic nanostructures through block copolymer self-assembly. Two- and three-dimensional complex nanostructures, such as “nanomesh,” “double-layered nanomeshes,” and “surface
Autor:
Seongheum Choi, Yunseok Kim, Kee-Won Kwon, Joon Uh, Hoijoon Kim, Taejin Park, Wonsik Ahn, Jin-Bum Kim, Hyoungsub Kim, Seong-Jun Jeong, Mirine Leem, Seongjun Park
Publikováno v:
RSC Advances. 7:884-889
Uniform deposition of high-k dielectrics on two-dimensional (2D) crystals is highly desirable for their use in future nano-electronic devices. Here, the surface coverage of the Al2O3 films grown by atomic layer deposition (ALD) was investigated on me
Autor:
Hyangsook Lee, Seong-Jun Jeong, Yunseok Kim, Mirine Leem, Seongjae Park, Changmin Lee, Seongjun Park, Eunha Lee, Wonsik Ahn, Hyoungsub Kim, Hoijoon Kim, Taejin Park
Publikováno v:
Thin Solid Films. 721:138544