Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Seon Gil Lee"'
Publikováno v:
Journal of Sensor Science and Technology. 25:86-90
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::092e7b2512fee7acb4b0bc8c153c80a5
https://doi.org/10.5369/jsst.2016.25.2.86
https://doi.org/10.5369/jsst.2016.25.2.86
Publikováno v:
Journal of Sensor Science and Technology. 22:321-326
In this paper, the usability of a compact silicon strain gauge load cell in a weighting disdrometer for measuring the impact load of afalling raindrop is introduced for application in a multi-meteorological sensor. The silicon strain gauge load cell
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c158a42820c56529d1def883f6dfcdf4
https://doi.org/10.5369/jsst.2013.22.5.321
https://doi.org/10.5369/jsst.2013.22.5.321
Publikováno v:
Journal of Sensor Science and Technology. 22:292-296
The ultrasonic wind sensor that pass through the air, beating the delivery of ultrasonic wind speed increases or decreases by thephysical characteristics of the wind speed and the direction of the sensor, the transmission and reception of ultrasonic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6fa558c0d08116d59d5d126c26e6f869
https://doi.org/10.5369/jsst.2013.22.4.292
https://doi.org/10.5369/jsst.2013.22.4.292
Publikováno v:
Journal of Sensor Science and Technology. 20:213-218
The load cell is a force sensor and a transducer that is used to convert a physical force into a electrical signal for weighing equipment. Most conventional load cells are widely used a metal foil strain gauge for sensing element when force being app
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a396d4f2f89561485a49f008ab27865
https://doi.org/10.5369/jsst.2011.20.3.213
https://doi.org/10.5369/jsst.2011.20.3.213
Publikováno v:
Journal of Sensor Science and Technology. 14:52-55
Ni oxide thin films with thermal sensitivity superior to Pt and Ni thin films were formed through annealing treatment after Ni thin films were deposited by a r.f. magnetron sputtering method. Resistivity values of Ni oxide thin films were in the rang
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f69fb7a5ff1d67f90923f303597381bb
https://doi.org/10.5369/jsst.2005.14.1.052
https://doi.org/10.5369/jsst.2005.14.1.052
Publikováno v:
ECS Meeting Abstracts. :58-58
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f406b52f42ced86971b547f42bcf0375
https://doi.org/10.1149/ma2010-02/1/58
https://doi.org/10.1149/ma2010-02/1/58