Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Seokhyoung Hong"'
Autor:
Sara Aoki, Masaki Koizumi, Masaki Sano, Tadahiro Ishizaka, Tatsuhiko Tanimura, Kentaro Shiraga, Masato Koizumi, Cheonsoo Han, Koji Akiyama, Seokhyoung Hong
Publikováno v:
2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC).
Advanced Sequential Flow Deposition (ASFD) TiON electrode was developed and mechanism of leakage current reduction with ASFD TiON electrode was studied. ASFD TiON film was fabricated by repeating TiN layer formation and oxidation. Resistivity and cry
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbd97aee047e99b78fd5881f61002743
https://doi.org/10.1109/iitc-amc.2016.7507724
https://doi.org/10.1109/iitc-amc.2016.7507724
Autor:
Ishizaka, Tadahiro, Koizumi, Masaki, Sano, Masaki, Seokhyoung Hong, Koizumi, Masato, Cheonsoo Han, Akiyama, Koji, Aoki, Sara, Shiraga, Kentaro, Tanimura, Tatsuhiko
Publikováno v:
2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC); 2016, p180-182, 3p
Autor:
Osamu Eryu, Mutsumi Touge, Yasumiti Matsumoto, Seokhyoung Hong, Okiharu Kirino, Hironobu Kashiwagi, Takashi Kawamukai, Junji Watanabe
Publikováno v:
The proceedings of the JSME annual meeting. :177-178
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cdc8243a33bf7d7ecc4a3deaccb163f2
https://doi.org/10.1299/jsmemecjo.2006.1.0_177
https://doi.org/10.1299/jsmemecjo.2006.1.0_177