Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Seiya Yoshinaga"'
Publikováno v:
Materials Science in Semiconductor Processing. 90:54-58
This research investigated the optical properties of silicon-rich silicon nitride (Si-rich SiN) and conventional silicon nitride (SiNx) layers, which are commonly used in anti-reflective coating (ARC) to improve the light absorption in solar cells. W
Autor:
Norihisa Harano, Hiroyuki Kanda, Tomitaro Harada, Abdullah Uzum, Seiya Yoshinaga, Hidehito Fukui, Yasuaki Ishikawa, Seigo Ito, Yukiharu Uraoka
Publikováno v:
Energy Science & Engineering. 4:269-276
Al2O3/TiO2 double layer anti-reflection coating (ARC) film formed by spray pyrolysis was introduced for monocrystalline silicon solar cells as the nonvacuum processing method. The thickness of the Al2O3 layer and TiO2 compact layer was controlled by
Autor:
Yunjian Jiang, Yosuke Watanabe, Seiya Yoshinaga, Tatsuki Honda, Yukiharu Uraoka, Hiroshi Ikenoue, Yasuaki Ishikawa
Publikováno v:
2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC).
We proposed CO2 laser doping technique as a fabrication method of c-Si solar cell, and demonstrated its availabilities with the cell characteristics. P and B-doping with relatively high carrier density around 1020 cm−3 were realized by the CO2 lase
Publikováno v:
Journal of Physics D: Applied Physics. 50:455108
Texture structure is usually fabricated on crystalline silicon (c-Si) solar cells to provide a low surface reflectance by an etching method such as alkali solution. In this study, we proposed nanoimprint lithography (NIL) as a fabrication process of
Autor:
Yunjiang Jiang, Tatsuki Honda, Yukiharu Uraoka, Shinji Araki, Yasuaki Ishikawa, Seiya Yoshinaga
Publikováno v:
Japanese Journal of Applied Physics. 56:022301
We investigated the surface reflectance of nanoimprinted textures on silicon. Zirconium oxide, which is a wide-bandgap inorganic dielectric material, was used as the texturing material. We performed several calculations to optimize the textures for t
Publikováno v:
2014 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK).
In order to reduce the back-contact silicon solar cell manufacturing process cost, polysilazane solution is used to form SiO 2 diffusion barrier layer in this study. The thickness and refractive index of SiO 2 film is evaluated by spectroscopic ellip
Publikováno v:
2013 IEEE International Meeting for Future of Electron Devices, Kansai.
We calculated the light trapping effect of nanoimprinted-textured (NT) structure for monocrystalline silicon solar cell using 2-dimentional simulator. Our calculation revealed that the 10 μm width for textured pyramid, in the case of ZnO used as a N
Publikováno v:
2013 IEEE 39th Photovoltaic Specialists Conference (PVSC).
In order to improve efficiency of Si solar cell, surface texturing is absolutely imperative structure to reduce the reflection loss of the surface of the solar cell. In this study, we evaluated the light of nanoimprinted-textured structure on the cel
Autor:
Ken Fukatsu, Yunjian Jiang, Yasuaki Ishikawa, Yutaka Kimura, Seigo Ito, Kenji Tanimoto, Abdullah Uzum, Seiya Yoshinaga, Yukiharu Uraoka, Hiroyuki Kanda
Publikováno v:
Nanoscale Research Letters
The phosphorus barrier layers at the doping procedure of silicon wafers were fabricated using a spin-coating method with a mixture of silica-sol and tetramethylammonium hydroxide, which can be formed at the rear surface prior to the front phosphorus
Autor:
Seiya Yoshinaga, Yasuaki Ishikawa, Shinji Araki, Tatsuki Honda, Yunjiang Jiang, Yukiharu Uraoka
Publikováno v:
Japanese Journal of Applied Physics; Feb2017, Vol. 56 Issue 2, p1-1, 1p