Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Seiichi Tsuchiya"'
Autor:
Susumu Oogi, Jun Yashima, Tomohiro Iijima, Takayuki Abe, Junichi Suzuki, Hideyuki Tsurumaki, Yoshiaki Hattori, Seiichi Tsuchiya, Hirohito Anze, Yoshiaki Onimaru
Publikováno v:
Japanese Journal of Applied Physics. 46:3359-3367
Present LSI technology requires very strict critical dimension (CD) control on masks. An electron beam (EB) mask writer has been widely used but is known to induce a fogging effect that affects CD control. In this paper, a new formula for calculating
Autor:
Hideo Inoue, Seiichi Tsuchiya, Mitsuko Shimizu, Hirohito Anze, Toru Tojo, Susumu Oogi, Tadahiro Takigawa, Tomohiro Iijima, Takayuki Abe, Yoshiaki Hattori, Takashi Kamikubo, Kazuto Matsuki
Publikováno v:
Japanese Journal of Applied Physics. 46:826-833
A high-accuracy proximity effect correction method for high-precision masks has been developed to satisfy current and future requirements. In this paper, we explain the primary features of this method and the theories on which it is based. The develo
Autor:
Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven Golladay, Rodney Kendall
Publikováno v:
SPIE Proceedings.
Autor:
Noriaki Nakayamada, Takashi Kamikubo, Ishimura Takiji, Rieko Nishimura, Soichiro Mitsui, Yoshitada Gomi, Seiichi Tsuchiya, Hitoshi Higurashi, Hitoshi Sunaoshi, Hideo Inoue, Hideki Matsui, Kenji Ohtoshi, Shuichi Tamamushi, Kiminobu Akeno, Susumu Oogi, Akinori Mine, Yuichi Tachikawa
Publikováno v:
SPIE Proceedings.
Optical lithography is facing resolution limit. To overcome this issue, highly complicated patterns with high data volume are being adopted for optical mask fabrications. With this background, new electron beam mask writing system, EBM- 7000 is devel
Autor:
Hiromichi Hoshi, Morihisa Hoga, Hiroyoshi Ando, Nobuyuki Yoshioka, Seiichi Tsuchiya, Junji Hirumi
Publikováno v:
SPIE Proceedings.
The shortening of electron beam settling time is important for the shortening of writing time of variable-shaped beam (VSB) writers. The settling time is the time until the electron beam is deflected to a desired position, and is settled. In the case
Autor:
Hitoshi Sunaoshi, Hideo Kusakabe, Shusuke Yoshitake, Shinsuke Nishimura, Hirotsugu Wada, Munehiro Ogasawara, Jun Takamatsu, Naoharu Shimomura, Seiichi Tsuchiya, Kiyoshi Hattori, Kiminobu Akeno, Yuuji Fukudome, Soichiro Mitsui, Toru Tojo, Mitsuko Shimizu
Publikováno v:
21st Annual BACUS Symposium on Photomask Technology.
A stage tracking function has been developed for a mask-scan EB mask writer. Position error of EB mask on an EB-mask-stage induces position error of projection beam on the EB-mask and the position of a writing pattern. The position of the EB-mask is
Autor:
Naoharu Shimomura, Yoshio Suzuki, Kimio Suzuki, Yoshiaki Hattori, Osamu Watanabe, Souji Koikari, Kiyomi Koyama, Kenji Ooki, Ryoichi Hirano, Noboru Yamada, Hideo Kusakabe, Satoshi Yasuda, Shinsuke Nishimura, Kenji Ohtoshi, Susumu Oogi, Hiroshi Hoshino, Susumu Watanabe, Hitoshi Higurashi, Takayuki Abe, Mitsuko Shimizu, Masaki Toriumi, Shigehiro Hara, Hirohito Anze, Yasuo Suzuki, Shiro Kurasawa, Kazuo Tsuji, Shusuke Yoshitake, Tadahiro Takigawa, Tomohiro Iijima, Takashi Kamikubo, Tetsu Akiyama, Hiroaki Suzuki, Shuichi Tamamushi, Mitsuhiro Yano, Toru Tojo, Ryoji Yoshikawa, Eiji Murakami, Mitsunobu Katayama, Kazuyuki Okuzono, Munehiro Ogasawara, Akira Noma, Koji Handa, Kazuto Matsuki, Hirokazu Yamada, Noriaki Nakayamada, Kiyoshi Hattori, Yuuji Fukudome, Yoshiaki Tada, Seiichi Tsuchiya, Yoji Ogawa, Kiminobu Akeno, Hideyuki Tsurumaki
Publikováno v:
SPIE Proceedings.
Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology
Autor:
Sumu Soshi, Satoshi Niki, Kazuyo Nakamura, Seiichi Tsuchiya, Mariko Tawaraya, Tamako Nagao, Makiko Kinjo
Publikováno v:
JAPANESE ORTHOPTIC JOURNAL. 16:160-164
A case of “Phoria-Myopia” was presented in this report.He was 29 years old who had astenopie complaints for 2 years.Visual acuity was decreased in binocular vision compared with in monocular vision.Excessive accomodative convergence (2.5D) in com