Thin film atomic layer deposition equipment for semiconductor processing

Autor: Sneh, Ofer ^*, Clark-Phelps, Robert B, Londergan, Ana R, Winkler, Jereld, Seidel, Thomas E

Publikováno v: In Thin Solid Films 2002 402(1):248-261

On the early history of atomic layer deposition:most significant works and applications

Autor: Aarik, Jaan, Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Cameron, David, Chekurov, Nikolai, Chubarov, Mikhail, Drozd, Viktor, Elliott, Simon, Gottardi, Gloria, Grigoras, Kestutis, Hwang, Cheol Seong, Junige, Marcel, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Koshtyal, Yury, Krause, Outi, Kääriäinen, Marja-Leena, Kääriäinen, Tommi, Lamagna, Luca, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Molarius, Jyrki, Norek, Malgorzata, Ozgit-Akgun, Cagla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Pyymaki-Perros, Alexander, Ras, Robin H. A., Roozeboom, Fred, Sajavaara, Timo, Savin, Hele, Seidel, Thomas E., Sundberg, Pia, Sundqvist, Jonas, Suyatin, Dmitry, Tallarida, Massimo, Törndahl, Tobias, Utriainen, Mikko, van Ommen, J. Ruud, Wächtler, Thomas, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana

Publikováno v: Aarik, J, Ahvenniemi, E, Akbashev, A R, Ali, S, Bechelany, M, Berdova, M, Cameron, D, Chekurov, N, Chubarov, M, Drozd, V, Elliott, S, Gottardi, G, Grigoras, K, Hwang, C S, Junige, M, Kallio, T, Kanervo, J, Khmelnitskiy, I, Koshtyal, Y, Krause, O, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Molarius, J, Norek, M, Ozgit-Akgun, C, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R L, Pyymaki-Perros, A, Ras, R H A, Roozeboom, F, Sajavaara, T, Savin, H, Seidel, T E, Sundberg, P, Sundqvist, J, Suyatin, D, Tallarida, M, Törndahl, T, Utriainen, M, van Ommen, J R, Wächtler, T, Wiemer, C, Ylivaara, O M E & Yurkevich, O 2016, ' On the early history of atomic layer deposition : most significant works and applications ', 16th International Conference on Atomic Layer Deposition, ALD 2016, Dublin, Ireland, 24/07/16-27/07/16 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::3b2b52ef81afcdd0edebc708b823184f
https://cris.vtt.fi/en/publications/03707523-8c1a-4bbc-8828-d8f850920e09

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Epi replacement in manufacturing using MeV implantation.

Autor: Borland, John O., Seidel, Thomas E.

Publikováno v: Solid State Technology. Jun96, Vol. 39 Issue 6, p89. 3p. 5 Diagrams, 1 Chart, 1 Graph.

Atomic layer deposition of dopants for recoil implantation in finFET sidewalls.

Autor: Seidel, Thomas E., Halls, Mathew D., Goldberg, Alexander, Elam, Jeffrey W., Mane, Anil, Current, Michael I.

Publikováno v: 2014 20th International Conference on Ion Implantation Technology (IIT); 2014, p1-4, 4p