Zobrazeno 1 - 8
of 8
pro vyhledávání: '"See-Eng Phan"'
Autor:
See-Eng Phan, Russel, William B.
Publikováno v:
Journal of Chemical Physics; 6/15/1998, Vol. 108 Issue 23, p9789, 7p, 1 Chart, 10 Graphs
Autor:
Biju Ninan, Kevin Moraes, See-Eng Phan, Tanaka Keiichi, Jianxin Lei, Chien-Teh Kao, Kishore Lavu, Srinivas Gandikota, Bingxi Wood, Xinliang Lu
Publikováno v:
2006 IEEE International Symposium on Semiconductor Manufacturing.
For advanced devices at 65 nm node and beyond, nickel silicide formed by depositing Ni or its alloys with subsequent annealing has been chosen as the source/drain and gate contact materials. An in-situ dry chemical cleaning technology (Siconi ) has b
Publikováno v:
Physical review. E, Statistical, nonlinear, and soft matter physics. 65(4 Pt 1)
Measurements of the low-shear viscosity eta(o) with a Zimm-Crothers viscometer for dispersions of colloidal hard spheres are reported as a function of volume fraction phi up to 0.56. Nonequilibrium theories based on solutions to the two-particle Smol
Publikováno v:
Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics. 60(2 Pt)
We present measurements of the high-frequency shear modulus and dynamic viscosity for nonaqueous hard sphere colloidal crystals both in normal and microgravity environments. All experiments were performed on a multipurpose PHaSE instrument. For the r
Autor:
William B. Russel, Zhengdong Cheng, Ronald H. Ottewill, Jixiang Zhu, See Eng Phan, John H. Dunsmuir, Paul Chaikin
Publikováno v:
Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics. 54(6)
Autor:
Kishore Lavu, Michael Smayling, Jianxin Lei, Srinivas Gandikota, Bingxi Wood, Chien-Teh Kao, Biju Ninan, See-Eng Phan
Publikováno v:
ECS Meeting Abstracts. :1289-1289
Pre-Silicide clean is a critical step in NiSi integration to keep silicide/Si interface clean and defect-free for good device performance. Traditional pre-silicide clean uses HF wet clean which requires tight queue time control to prevent native oxid
Autor:
Jianxin Lei, See-Eng Phan, Xinliang Lu, Chien-Teh Kao, Lavu, K., Moraes, K., Tanaka, K., Wood, B., Biju Ninan, Gandikota, S.
Publikováno v:
2006 IEEE International Symposium on Semiconductor Manufacturing; 2006, p393-396, 4p
Autor:
Kuratomi, Takashi1 takashi_kuratomi@amat.com, Diehl, Daniel L.2, See-Eng Phan3, Chien-Teh Kao4, Futase, Takuya5, Maekawa, Kazuyoshi6
Publikováno v:
Solid State Technology. Jan2007, Vol. 50 Issue 1, p33-36. 3p.