Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Se Il Cho"'
Publikováno v:
Thin Solid Films. 337:200-202
The electrical and optical properties of the a-Si:H films deposited by inductively-coupled plasma chemical vapour deposition (ICP-CVD) have been investigated. The ICP-CVD a-Si:H films deposited at 30 mTorr exhibited the deposition rate of 0.9 A/s and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab13e1c92b72c5f34cbd031da26da422
https://doi.org/10.1016/s0040-6090(98)01380-7
https://doi.org/10.1016/s0040-6090(98)01380-7
Publikováno v:
SID Symposium Digest of Technical Papers. 29:379
A novel self-aligned coplanar a-Si:H TFT was developed using the three stacked layers of thin a-Si: H, silicon-nitride (SiNx), and a-Si:H. After patterning thin a-Si:H and SiNx, the structure was ion-doped and then Ni layer was deposited. The fabrica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25f090ded54e00d3f8da7ad0a2b06da9
https://doi.org/10.1889/1.1833771
https://doi.org/10.1889/1.1833771