Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Sayalee Gharat"'
Autor:
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, Vlad Liubich
Publikováno v:
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::648c5e36999099d926fcf6a6896b11dd
https://doi.org/10.1117/12.2641557
https://doi.org/10.1117/12.2641557
Autor:
Ravi Pai, Sandeep Koranne, Sayalee Gharat, Ingo Bork, Jin Choi, Bhardwaj Durvasula, Soo Jung Ryu, Alexander Tritchkov, Minah Kim, Joon-Soo Park, Peter Buck, Sukho Lee, Nageswara S. V. Rao
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 20
Inverse lithography technology (ILT) optical proximity correction is going to play a critical role in addressing challenges of optical and EUV lithography as the industry pushes toward advanced nodes. One major barrier in adoption of ILT has been the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::60914370452fe1b802a51103c3d0e4c3
https://doi.org/10.1117/1.jmm.20.4.041403
https://doi.org/10.1117/1.jmm.20.4.041403
Autor:
Sandeep Koranne, Sayalee Gharat, Bhardwaj Durvasula, Peter Buck, Ravi R. Pai, Alexander Tritchkov
Publikováno v:
Optical Microlithography XXXIV.
Inverse Lithography Technology OPC (ILT) is going to play a critical role in addressing challenges of optical and EUV lithography as industry pushes towards advanced nodes. One major barrier in adoption of ILT was mask writer’s inability to efficie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb0409a8a3858610c24a6fc986d4d665
https://doi.org/10.1117/12.2588374
https://doi.org/10.1117/12.2588374