Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Sax Liao"'
Autor:
Arie Jeffrey Den Boef, Justin Huang, Jeff Lin, Frank Sun, Matthew McLaren, Edison Wang, Farzad Farhadzadeh, Momo Lin, Kaustuve Bhattacharyya, Wilson Liu, Jason Hung, Marc Noot, Benny Gosali, Ken Chang, Cathy Wang, Sax Liao, Simon Gijsbert Josephus Mathijssen
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
An after etch overlay measurement on device is typically used as a reference overlay as this is what determines the final overlay. The delta between on target overlay from after develop (ADI) and this reference overlay on device after etch (AEI) is k
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8981325562d805f21c4d5d02db2a3ad5
https://doi.org/10.1117/12.2583861
https://doi.org/10.1117/12.2583861
Autor:
Guo-Tsai Huang, John Lin, Christophe Fouquet, Kevin Cheng, Eason Su, Arie Jeffrey Den Boef, Benny Gosali, Ken Chang, Marc Noot, Kai-Hsiung Chen, Kaustuve Bhattacharyya, Hammer Chang, Cathy Wang, Sax Liao
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
Success of diffraction-based overlay (DBO) technique1,4,5 in the industry is not just for its good precision and low toolinduced shift, but also for the measurement accuracy2 and robustness that DBO can provide. Significant efforts are put in to capi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a366300caed91b796a49c3d6f8ee711
https://doi.org/10.1117/12.2297420
https://doi.org/10.1117/12.2297420
Autor:
Martin Jacobus Johan Jak, Andreas Fuchs, Kevin Cheng, Grzegorz Grzela, L. G. Terng, Wilson Tzeng, Christophe Fouquet, Marc Noot, Guo-Tsai Huang, Ken Chang, Y. C. Wang, Eason Su, Omer Adam, Arie Jeffrey Den Boef, Chih-Ming Ke, Kai-Hsiung Chen, Cathy Wang, Sax Liao, Vincent Couraudon, Kaustuve Bhattacharyya
Publikováno v:
SPIE Proceedings.
The optical coupling between gratings in diffraction-based overlay triggers a swing-curve1,6 like response of the target’s signal contrast and overlay sensitivity through measurement wavelengths and polarizations. This means there are distinct meas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a3ddbb2f8940f861ad1198f216fa88b
https://doi.org/10.1117/12.2257662
https://doi.org/10.1117/12.2257662
Autor:
Bhattacharyya, Kaustuve, Noot, Marc, Chang, Hammer, Sax Liao, Chang, Ken, Gosali, Benny, Su, Eason, Wang, Cathy, den Boef, Arie, Fouquet, Christophe, Guo-Tsai Huang, Kai-Hsiung Chen, Cheng, Kevin, Lin, John
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-8, 8p