Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Savitha Nalini"'
Publikováno v:
Materials Research Express, Vol 7, Iss 1, p 015618 (2020)
In this work, we report the nonlinear optical absorption and asymmetric charge carrier conduction in single layer graphene films deposited by chemical vapor deposition (CVD) technique on copper foils with pretreated surface. XRD texture and pole figu
Externí odkaz:
https://doaj.org/article/beabe2f4ea8146f9b93f1fa5c007d39c
Publikováno v:
Materials Science and Technology. 39:933-940
Publikováno v:
Bulletin of Materials Science. 43
In chemical vapour deposition (CVD) of graphene, surface roughness and purity of the copper substrate are very crucial for obtaining uniform films. Even though electrochemical polishing is an effective technique for obtaining homogeneous graphene fil
Publikováno v:
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI.
Molybdenum disulpihde mono/few layers were deposited by pulsed laser deposition on graphene substrates thereby forming MoS2 - graphene van der Waal heterostructures. Initially, the optimization of the growth MoS2 layers were carried out on thermal ox
Publikováno v:
AIP Conference Proceedings.
In the present study, the field effect behavior of graphene films grown in a home-built CVD system was analyzed by fabricating graphene field effect transistor (GFET). Under the electrostatic effect of applied gate voltage, graphene films showed unip
Publikováno v:
PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS: ICAM 2019.
Graphene-Zinc oxide (ZnO) hybrid has attracted much interest since the properties of both materials can be extracted. Graphene has high mobility of charge carriers and has zero band gap but ZnO is wide band gap and have large excitonic energy. Graphe
Publikováno v:
Materials Research Express. 7:015618
In this work, we report the nonlinear optical absorption and asymmetric charge carrier conduction in single layer graphene films deposited by chemical vapor deposition (CVD) technique on copper foils with pretreated surface. XRD texture and pole figu
Publikováno v:
Applied Physics A. 123
This study utilizes microwave plasma-assisted atomic layer deposition (MPALD) in remote mode to deposit Al2O3 thin films with increased growth per cycle (GPC). Optical emission spectroscopy (OES) was used to identify the plasma configuration in the A
Publikováno v:
Materials Research Express. 5:115604
Publikováno v:
Materials Research Express; Nov2018, Vol. 5 Issue 11, p1-1, 1p