Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Saul Lee"'
Publikováno v:
The AAPS journal. 17(5)
The focus of this investigation was to understand the design space to achieve comparable in vitro performance of two multi-unit dose dry powder inhalers (DPIs)—Flixotide® Accuhaler® (reference product) and MultiHaler® (test product). Flow field,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4a286c8c989acdab1e019ba8aca1d318
https://pubmed.ncbi.nlm.nih.gov/25956383
https://pubmed.ncbi.nlm.nih.gov/25956383
Autor:
Jeffrey R. Lancaster, Nicholas J. Turro, Xinyu Gu, C. Grant Willson, Adam J. Berro, Tomoki Nagai, Saul Lee, Paul Zimmerman, Naphtali A. O'Connor, Steffen Jockusch, Toshiyuki Ogata
Publikováno v:
Chemistry of Materials. 20:7374-7376
A 2-methoxynaphthalene dimer system is demonstrated as a sequential two photon photoacid generator for double exposure (DE) lithography. DE is based on the use of staggered exposures and is proposed as a replacement for conventional optical lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dbbe1b1d3cc1ceb373e21da6f8b012f5
https://doi.org/10.1021/cm802343u
https://doi.org/10.1021/cm802343u
Autor:
Matthew S. Shafran, Whitney Longsine, Wei Zhang, J. W. Irving, Saul Lee, Weijun Liu, Brian Fletcher, Van N. Truskett, Luo Kang, Douglas J. Resnick, Xiaoming Lu, Sidlgata V. Sreenivasan, Zhengmao Ye, Frank Y. Xu, Dwayne L. LaBrake
Publikováno v:
Alternative Lithographic Technologies V.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography (J-FIL) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e750e50fd1ef6de9e605c2c80bdda2ae
https://doi.org/10.1117/12.2013694
https://doi.org/10.1117/12.2013694
The current optical photolithography technology is approach- ing the physical barrier to the minimum achievable feature size. To pro- duce smaller devices, new resolution enhancement technologies must be developed. Double-exposure lithography has sho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2942b376a4ccf7f9f9b05d762a14c0f8
Autor:
Jeffrey R. Lancaster, Arunkumar K. Sundaresan, Kane Jen, Paul Zimmerman, William J. Durand, Steffen Jockusch, Adam J. Berro, C. Grant Willson, Toshiyuki Ogata, Cho Youn-Jin, Tomoki Nagai, Xinyu Gu, Nicholas J. Turro, Saul Lee
193 immersion lithography has reached its maximal achievable resolution. There are mainly two lithographic strategies that will enable continued increase in resolution. Those are being pursued in parallel. The first is extreme ultraviolet (EUV) litho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9796ccea138bdb20e0390ecedb157d9b
Autor:
C. Grant Willson, Tsutomu Shimokawa, Colin C. Neikirk, Koichi Fujiwara, Koji Ito, William H. Heath, Isao Nishimura, Saul Lee, Wei Lun Jen, Kazuya Matsumoto
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
Acid diffusion during the post-exposure bake of chemically amplified resists (CARs) is a major contributing factor to line width roughness (LWR) and resolution limits at the 32 nm node and beyond. To overcome these limitations, non-CAR materials are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7bf7e9ba11f64fbeef8836fb281bcdc1
https://doi.org/10.1117/12.772646
https://doi.org/10.1117/12.772646
Autor:
Nicholas J. Turro, Kane Jen, Jeffrey D. Byers, C. Grant Willson, Paul Zimmerman, Bryan J. Rice, Saul Lee
The current optical photolithography technology is approaching the physical barrier to the minimum achievable feature size. To produce smaller devices, new resolution enhancement technologies must be developed. Double exposure lithography has shown p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::71da23872a99041fdd0dfdd1348b2e3a
Autor:
Michael D. Dickey, Jason E. Meiring, Roger T. Bonnecaze, Scott M. Grayson, C. Grant Willson, Saul Lee, Peter Carmichael
Publikováno v:
MRS Proceedings. 1002
The ability to mass produce biosensor arrays at low costs is an important target for the diagnostics industry. Our group has previously explored the batch production of mesoscale sized hydrogels as platforms for biosensors using photolithographic tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ab8311d7a6e3b39aece7cb7c69360db
https://doi.org/10.1557/proc-1002-n07-08
https://doi.org/10.1557/proc-1002-n07-08
Double patterning and double exposure techniques have been proposed as possible methods for reducing half pitch resolution below k1=0.25. Both methods have the potential to reduce the theoretical lithographic half pitch to k1=0.125. Double patterning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::da9eb607f411f059ac9a3fe655e61639
Autor:
Saul Lee, Elizabeth A. Costner, Matthew J. Schmid, Jason E. Meiring, Timothy Michaelson, Scott M. Grayson, C. Grant Willson
Publikováno v:
Optical Engineering. 48:037201
A pattern-recognition and encoding system has been developed for a biochip platform using shaped hydrogel sensors batch produced via photolithography. Each sensor shape is fashioned with a unique pattern of dots that makes it identifiable to a patter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::24f8e66730e6935c75bcfa99ddc28239
https://doi.org/10.1117/1.3099722
https://doi.org/10.1117/1.3099722