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Akademický článek

Effect of annealing treatments on CeO2 grown on TiN and Si substrates by atomic layer deposition

Autor: Silvia Vangelista, Rossella Piagge, Satu Ek, Alessio Lamperti

Publikováno v: Beilstein Journal of Nanotechnology, Vol 9, Iss 1, Pp 890-899 (2018)

In this work, we investigate the effect of thermal treatment on CeO2 films fabricated by using atomic layer deposition (ALD) on titanium nitride (TiN) or on silicon (Si) substrates. In particular, we report on the structural, chemical and morphologic

Externí odkaz: https://doaj.org/article/b1c7630648114d29a1992ed7aff863c3

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Continuously operated falling film microreactor for selective hydrogenation of carbon–carbon triple bonds

Autor: Lioubov Kiwi-Minsker, Satu Ek, Charline Berguerand, Linda Zh. Nikoshvili, Ralf Zapf, Thomas H. Rehm, Patrick Löb

Publikováno v: Chemical Engineering Journal. 293:345-354

Despite significant advances in the fabrication and applications of microreactors for production of chemicals, their use for catalytic reactions remains a challenge, especially in fine chemical synthesis where the selectivity towards the desired prod

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::daae21e06f18ca2c786757bf705e2aa4
https://doi.org/10.1016/j.cej.2016.02.081

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Effect of annealing treatments on CeO2 grown on TiN and Si substrates by atomic layer deposition

Autor: Satu Ek, Rossella Piagge, S. Vangelista, Alessio Lamperti

Publikováno v: Beilstein journal of nanotechnology 9 (2018): 890–899. doi:10.3762/bjnano.9.83
info:cnr-pdr/source/autori:Vangelista, Silvia; Piagge, Rossella; Ek, Satu; Lamperti, Alessio/titolo:Effect of annealing treatments on CeO2 grown on TiN and Si substrates by atomic layer deposition/doi:10.3762%2Fbjnano.9.83/rivista:Beilstein journal of nanotechnology/anno:2018/pagina_da:890/pagina_a:899/intervallo_pagine:890–899/volume:9
Beilstein Journal of Nanotechnology, Vol 9, Iss 1, Pp 890-899 (2018)

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::49dac77df597681013e99af72567354f
http://www.cnr.it/prodotto/i/431695

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Effect of annealing treatments on CeO

Autor: Silvia, Vangelista, Rossella, Piagge, Satu, Ek, Alessio, Lamperti

Publikováno v: Beilstein Journal of Nanotechnology

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=pmid________::0d7e6e9d984cf1c1cf5115463025e964
https://pubmed.ncbi.nlm.nih.gov/29600150

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Biocompatible ALD barrier coatings for medical devices

Autor: Erik Ostreng, Oili Ylivaara, Paivi Jarvinen, Riina Ritasalo, Satu Ek, Mikko Matvejeff, Jesse Kalliomaki

Publikováno v: Matvejeff, M, Ek, S, Ritasalo, R, Kalliomäki, J, Järvinen, P, Ylivaara, O & Östreng, E 2017, Biocompatible ALD barrier coatings for medical devices . in Proceedings of 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) ., 7947504, IEEE Institute of Electrical and Electronic Engineers, pp. 56-58, Electron Devices Technology and Manufacturing Coneference, EDTM 2017, Toyama, Japan, 28/02/17 . https://doi.org/10.1109/EDTM.2017.7947504

Atomic layer deposition (ALD) is widely in use for depositing a variety of materials, such as metal oxides, metal nitrides and metals, in a conformal and defect-free form at low temperatures on high aspect-ratio substrates. These advantages make ALD

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ce0ca4ebb097da1c8ca03dd5919b2aee
https://cris.vtt.fi/en/publications/5e72ed2c-fa7d-40fe-a9db-84cac4df59c3

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Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties

Autor: Satu Ek, S. Vangelista, Tiina Sarnet, Rossella Piagge, Alessio Lamperti, Gabriella Ghidini

Publikováno v: MRS Advances 2 (2017): 3005–3010. doi:10.1557/adv.2017.404
info:cnr-pdr/source/autori:Vangelista, Silvia; Piagge, Rossella; Ek, Satu; Sarnet, Tiina; Ghidini, Gabriella; Lamperti, Alessio/titolo:Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties/doi:10.1557%2Fadv.2017.404/rivista:MRS Advances/anno:2017/pagina_da:3005/pagina_a:3010/intervallo_pagine:3005–3010/volume:2

Cerium dioxide (CeO2) thin films were deposited by atomic layer deposition (ALD) on both Si and TiN substrates. The ALD growth produces CeO2 cubic polycrystalline films on both substrates. However, the films show a preferential orientation along crys

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ddff39f7399f47ce1513392e146a533f
https://publications.cnr.it/doc/431701

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A 29Si and 13C CP/MAS NMR Study on the Surface Species of Gas-Phase-Deposited γ-Aminopropylalkoxysilanes on Heat-Treated Silica

Autor: Eero Iiskola, Satu Ek, Andrew Root, Tuula T. Pakkanen, Lauri Niinistö, Jari Vaittinen

Publikováno v: The Journal of Physical Chemistry B. 108:11454-11463

The aim of the present solid-state NMR study was to characterize the surface species of γ-aminopropyltriethoxysilane (APTS), γ-aminopropyltrimethoxysilane (APTMS), and γ-aminopropyldiethoxymethylsilane (APDMS) on porous silica when the deposition

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9cdc0550e29b3fc515dc5116712de4e8
https://doi.org/10.1021/jp048927z

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Atomic Layer Deposition of Amino-Functionalized Silica Surfaces Using N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane as a Silylating Agent

Autor: and Eero I. Iiskola, Lauri Niinistö, Satu Ek

Publikováno v: The Journal of Physical Chemistry B. 108:9650-9655

Atomic layer deposition (ALD) technique can be used for the preparation of amino-functionalized silica surfaces and for the study of the gas−solid reactions. In the present study N-(2-aminoethyl)-3-aminopropyltrimethoxysilane (AAPS) was used as a s

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::637bafb614454d95670ea8cc6c8eba64
https://doi.org/10.1021/jp0499629

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Atomic Layer Deposition of a High-Density Aminopropylsiloxane Network on Silica through Sequential Reactions of γ-Aminopropyltrialkoxysilanes and Water

Autor: Satu Ek, Tuula Pakkanen, Jetta Keränen, Eero I. Iiskola, Lauri Niinistö, Aline Auroux, Jari Vaittinen

Publikováno v: Langmuir. 19:10601-10609

A novel gas-phase procedure for the control of amino group density on porous silica through consecutive reactions of aminopropylalkoxysilanes and water vapor was developed. First heat-treated silica was saturated with trifunctional γ-aminopropyltrim

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d443602bdef3420ad8050723507319a1
https://doi.org/10.1021/la035472g

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Preparation, characterization and activity testing of vanadia catalysts deposited onto silica and alumina supports by atomic layer deposition

Autor: Satu Ek, Lauri Niinistö, Jetta Keränen, Aline Auroux

Publikováno v: Applied Catalysis A: General. 228:213-225

A gas phase preparation technique, atomic layer deposition (ALD), was applied to synthesize supported vanadium oxide catalysts. The growth of vanadia on silica and alumina was achieved by chemisorption of the volatilized vanadium precursor onto surfa

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0e177e2c3c4153d102865a987daf1f1f
https://doi.org/10.1016/s0926-860x(01)00975-9

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