Výsledky vyhledávání - "Satterfield, Michael J."

Akademický článek

Micromasking of plasma etching due to bacteria: A yield detractor for ULSI.

Autor: Perera, Asanga H., Satterfield, Michael J.

Publikováno v: IEEE Transactions on Semiconductor Manufacturing. Nov96, Vol. 9 Issue 4, p577. 4p. 8 Black and White Photographs, 2 Diagrams.

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Conference

Using laser surface scanning and bare wafer review to diagnose photolithography track developer process-induced defect issues.

Autor: Bond, Linda M., Fischer, Christine, Satterfield, Michael J., Sutton, Dan, Turnquest, Karen L.

Publikováno v: Proceedings of SPIE; Nov1999, Issue 1, p542-550, 9p

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Conference

Using optical pattern filtering defect inspection tools and process-induced defects per wafer pass for process defect control.

Autor: Alvis, John R., Satterfield, Michael J., Gabella, Patricia

Publikováno v: Proceedings of SPIE; Nov1996, Issue 1, p217-232, 16p

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Conference

Yield enhancement through monitoring of real-time manufacturing processes.

Autor: Henis, Neil B., Satterfield, Michael J., Travis, Edward O., Gelatos, Carol

Publikováno v: Proceedings of SPIE; 11/ 1/1994, Issue 1, p91-101, 11p

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