Multilayer resist dry etching technology for deep submicron lithography.

Autor: Tokashiki, Ken, Sato, Kiyoyuki, Aoto, Nahomi, Ikawa, Eiji

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2284-2287, 4p