Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Sascha Perlitz"'
Autor:
Shravan Matham, Daniel Corliss, Jed H. Rankin, Erik Verduijn, Pawitter Mangat, Nelson Felix, Dirk Hellweg, Obert Wood, Renzo Capelli, Sascha Perlitz, Yulu Chen, Francis Goodwin, Ravi K. Bonam
Publikováno v:
SPIE Proceedings.
We report on the printability, mitigation and actinic mask level review of programmed substrate blank pit and bump defects in a EUV lithography test mask. We show the wafer printing behavior of these defects exposed with an NXE:3300 EUV lithography s
Publikováno v:
SPIE Proceedings.
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
The EUV mask infrastructure is of key importance for the successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. ZEISS and the
Autor:
Sascha Perlitz, Jan Hendrik Peters, Markus Weiss, Dirk Hellweg, Renzo Capelli, Krister Magnusson, Matt Malloy, Stefan Wurm
Publikováno v:
SPIE Proceedings.
Autor:
Markus R. Weiss, Dirk Hellweg, Markus Koch, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Krister Magnusson, Renzo Capelli, Vibhu Jindal
Publikováno v:
SPIE Proceedings.
The EUV mask infrastructure is of key importance for the successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. To realize suc
Autor:
Ulrich Matejka, Jan Hendrik Peters, Krister Magnusson, Sascha Perlitz, Michael Goldstein, Anthony Garetto, Markus Weiss, Dirk Hellweg, Renzo Capelli
Publikováno v:
SPIE Proceedings.
Overcoming the challenges associated with photomask defectivity is one of the key aspects associated with EUV mask infrastructure. In addition to establishing specific EUV mask repair approaches, the ability to identify printable mask defects that re
Autor:
Jan Hendrik Peters, Anthony Garetto, Michael Goldstein, Markus Weiss, Sascha Perlitz, Dirk Hellweg
Publikováno v:
SPIE Proceedings.
The EUV mask infrastructure is of key importance for a successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks, actinic review of potential defect sites is required. To realize such an
Autor:
Sascha Perlitz, Markus Weiss, Dirk Hellweg, Jan Hendrik Peters, Ulrich Matejka, Anthony Garetto
Publikováno v:
SPIE Proceedings.
In previous conferences the status of the AIMS™ EUV project has been presented in which the basic layout scheme and preliminary design have been shown along with the targeted performance specification levels to be met. Presently the final design mi
Autor:
Michael Goldstein, Markus Weiss, Sascha Perlitz, Dirk Hellweg, Wolfgang Harnisch, Jan Hendrik Peters
Publikováno v:
SPIE Proceedings.
The EUV mask infrastructure is of key importance for a successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. With such a revi
Autor:
Dirk Hellweg, Ulrich Dr. Strößner, Jan Hendrik Peters, Sascha Perlitz, Markus Weiss, Wolfgang Harnisch
Publikováno v:
SPIE Proceedings.
The high volume device manufacturing infrastructure for the 22nm node and below based on EUVL technology requires defect-free EUV mask manufacturing as one of its foundations. The EUV Mask Infrastructure program (EMI) initiated by SEMATECH has identi