Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Sanju Pancholi"'
Autor:
Clifford L. Henderson, Katherine D. Dombrowski, Pavlos C. Tsiartas, Sanju Pancholi, Sajed A. Chowdhury, C. Grant Willson, Ralph R. Dammel
Publikováno v:
Advances in Resist Technology and Processing XIV.
Accurate photoresist modeling parameters are required for correct lithographic simulations. In particular, three sets of data are required to model a typical non-chemically amplified resist: the refractive index as a function of wavelength and exposu
Publikováno v:
Advances in Resist Technology and Processing XIV.
Lithography simulation has become an increasingly important tool for the semiconductor industry as attempts are made to extend current lithographic technologies. The usefulness of this simulation capability has been somewhat hindered by the lack of a
Autor:
C. Grant Willson, Sanju Pancholi, Ralph R. Dammel, Clifford L. Henderson, Gardiner Allen B, Chris A. Mack, William J. Koros, Anwei Qin, William D. Hinsberg
Publikováno v:
Advances in Resist Technology and Processing XIV.
Simulation of the microlithographic process plays an increasingly important role in the manufacturing of integrated circuitry. Unfortunately, most lithography simulations still lack fundamental relationships that link the resist chemistry and the fin
Photoresist characterization for lithography simulation: IV. Processing effects on resist parameters
Autor:
Sajed A. Chowdhury, Clifford L. Henderson, Pavlos C. Tsiartas, Katherine D. Dombrowski, Lewis W. Flanagin, Ammar N. Chinwalla, Sanju Pancholi, C. Grant Willson
Publikováno v:
Advances in Resist Technology and Processing XIV.
In the past, resist parameters (exposure and development parameters) were typically only available for a single set of processing conditions. Therefore, it has been impossible to explore the effect of processing conditions on resist performance using
Autor:
Pavlos C. Tsiartas, C. Grant Willson, Adam R. Pawlowski, Logan L. Simpson, Clifford L. Henderson, Kelly D. Clayton, Sanju Pancholi
Publikováno v:
SPIE Proceedings.
Resist function depends upon photoinduced changes in the dissolution rate of phenolic polymer films in aqueous base. The events that occur as the molecules in these films move from the glassy state into solution are not well understood. This paper pr