Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Sanjay Yedur"'
Autor:
Jie Li, Holger Schroder, Sanjay Yedur, Peter Wilkens, Karthik Boinapally, Shahin Zangooie, John Piggot, Babak Khamsepour, Avraham Ver, Zhuan Liu, Jiangtao Hu
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Reducing parameter correlations to enhance scatterometry measurement accuracy, precision and tool matching is a crucial component of every modeling effort. Parameter sensitivity can largely depend on the orientation of the plane of incidence relative
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9667b371c3e658e03a2406839488b8ba
https://doi.org/10.1117/12.2046165
https://doi.org/10.1117/12.2046165
Autor:
Xi Zou, Zhuan Liu, Jiangtao Hu, Jie Li, Peter Wilkens, Karthik Boinapally, Shahin Zangooie, Avraham Ver, Sanjay Yedur, Babak Khamsepour, Robert A. Cohen
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Optical critical dimension (OCD) metrology using scatterometry has been widely adopted for fast and non-destructive in-line process control and yield improvement. Recently there has been increased interest in metrology performance enhancement through
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::998b02afef05813f42f720ea0cbb4900
https://doi.org/10.1117/12.2046639
https://doi.org/10.1117/12.2046639
Autor:
Sanjay Yedur, Kris A. Berglund
Publikováno v:
Applied Spectroscopy. 50:866-870
Measurement of supersaturation is of critical importance in the operation and control of crystallizers. In this work, we report a novel spectroscopic technique to achieve the measurement of concentration and supersaturation in crystallizing solutions
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a30b9123764f6558b38e3af75fc16f4
https://doi.org/10.1366/0003702963905484
https://doi.org/10.1366/0003702963905484
Publikováno v:
Industrial & Engineering Chemistry Research. 35:663-671
It is necessary to develop alternate pathways for the production of chemicals that are traditionally produced from fossil fuels to reduce our dependency on nonrenewable energy sources. In this paper, an alternate technology is presented for producing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df5c68ca8b25a5231bd0ce4bf0b26e46
https://doi.org/10.1021/ie950414e
https://doi.org/10.1021/ie950414e
Publikováno v:
Microlithography: Science and Technology, Second Edition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dd39fcadd41d577a4774f208e10208e
https://doi.org/10.1201/9781420051537.ch14
https://doi.org/10.1201/9781420051537.ch14
Publikováno v:
SPIE Proceedings.
Evaluation of lithography process or stepper involves very large quantity of CD measurements and measurement time. In this paper, we report on a application of Scatterometry based metrology for evaluation of binary photomask lithography. Measurements
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::608b478666204732d2765a240819e98f
https://doi.org/10.1117/12.729246
https://doi.org/10.1117/12.729246
Autor:
Milad Tabet, Yasuhiro Okumoto, Emily Gallagher, Sangbong Lee, Shifang Li, Craig Benson, Michael Kwon, Sanjay Yedur, Masaru Higuchi
Publikováno v:
SPIE Proceedings.
Optical scatterometry-based metrology is now widely used in wafer fabs for lithography, etch, and CMP applications. This acceptance of a new metrology method occurred despite the abundance of wellestablished CD-SEM and AFM methods. It was driven by t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27e8e07c3cc56f2182fa05c5f4682ef3
https://doi.org/10.1117/12.714997
https://doi.org/10.1117/12.714997
Autor:
Jie Li, Sanjay Yedur, Avraham Ver, Zhuan Liu, Peter Wilkens, Robert Cohen, Holger Schroder, Babak Khamsehpour, Jiangtao Hu, John Piggot, Karthik Boinapally, Shahin Zangooie, Xi Zou
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:041406
Scatterometry performance enhancement is demonstrated through a holistic approach by utilizing comprehensive information from various sources, including data from different process steps, different toolsets, multiple structures, and multiple optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52911669e0ecd0599da9478493be47fd
https://doi.org/10.1117/1.jmm.13.4.041406
https://doi.org/10.1117/1.jmm.13.4.041406
Conference
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Conference
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