Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Sanggil Bae"'
Publikováno v:
SPIE Proceedings.
Hardmask processes are a key technique to enable low-k semiconductors, but they can have an impact on patterning control, influencing defectivity, alignment, and overlay. Specifically, amorphous carbon layer (ACL) hardmask schemes can negatively affe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f2ff548410a3c7aba1eb316475e7acd
https://doi.org/10.1117/12.2258099
https://doi.org/10.1117/12.2258099
Publikováno v:
SPIE Proceedings.
Wafer topography structures in the implant lithography process, which include the shallow trench isolation and the poly gate, can result into a severe degradation of the resist profile and significant critical dimension variation. While bottom anti-r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa126768e79f74633d698a3ec28f5e58
https://doi.org/10.1117/12.846002
https://doi.org/10.1117/12.846002