Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Sang-Kee Eah"'
Autor:
Joseph F. Shepard, Henrik Johanson, Vandana Venkatasubramanian, Jay Mody, Takmeel Qanit, Ashwini Chandrasekar, Eswar Ramanathan, Craig Child, AnbuSelvam Km Mahalingam, Lei Jiang, Brett T. Cucci, Alycia Roux, O'brien Brendan, Christa Montgomery, Bradley Morganfeld, Keith Donegan, Colin Bombardier, Sang-Kee Eah, Vijaya Rana, Ghosh Somnath, Daniel Damjanovic, Anirvan Sircar, Zhiguo Sun, Singh Sunil K, Rebekah Sheraw, Ordonio Christopher, Silvestre MaryClaire, Adam DaSilva
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
As technology scaling continues, the selection of materials for sacrificial hard masks become very critical. Sacrificial hard masks are thin films that are used for patterning or protecting critical underlying films from damage during various process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b80f0efb35ac3f6be7ae230059a989a
https://doi.org/10.1109/asmc.2019.8791788
https://doi.org/10.1109/asmc.2019.8791788
Autor:
Pietro Babighian, Muhammed Pallachali, Nicolai Petrov, Tamer Desouky, Teck Jung Tang, Fadi Batarseh, Deborah Ryan, Shweta Shokale, Mark Terry, Haizhou Yin, Rohan Deshpande, Jiechang Hou, Yixiao Zhang, Sang-Kee Eah, Rao Desineni, Feng Wang, Ahmed Khalil
Publikováno v:
Photomask Technology.
Lithography process variation as well as etch and topography have always been a stubborn challenge for advanced technology nodes, i.e. 14nm and beyond. This variability usually results in defects aggregating around the edge of the wafer and leading t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::379ffba485daca644e6c71206a0b34f3
https://doi.org/10.1117/12.2280568
https://doi.org/10.1117/12.2280568
Publikováno v:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
The concept of layout-centric defect inspection targeting specific configurations of design is not new. The majority of design-based Micro Care Areas (MCA) relies on historical findings — translating failing topologies from Failure Analysis (FA), D
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b8fd9cfec83ebaf4ba1359b972917ac
https://doi.org/10.1109/asmc.2017.7969240
https://doi.org/10.1109/asmc.2017.7969240
Autor:
Hüseyin Kurtuldu, Sang-Kee Eah, Jenah Harris-Jones, Martin Samayoa, Matt House, Lauren Morse, Abbas Rastegar
Publikováno v:
SPIE Proceedings.
Particle contamination in ultra-pure water (UPW) and chemicals will eventually end up on the surface of a wafer and may result in killer defects. To improve the semiconductor processing yield in sub-10 nm half pitch nodes, it is necessary to control
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b3947fef7ef0cc5284738793bd8f8ed6
https://doi.org/10.1117/12.2048080
https://doi.org/10.1117/12.2048080
Publikováno v:
Review of Scientific Instruments. 68:2783-2786
We have developed a novel digital feedback scheme of distance control via shear-force measurement in the near-field scanning optical microscope. Using simple comparators, full digital control is achieved. In this new scheme, the probe tip stops at a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e41f478a8ab6c313759bf174af8493ba
https://doi.org/10.1063/1.1148195
https://doi.org/10.1063/1.1148195
Publikováno v:
Review of Scientific Instruments. 74:4969-4971
We report a simple method of generating nearly diffraction-limited focused spot with a fiber axicon microlens. It is fabricated at the end of a commercially available single-mode optical fiber by the selective chemical etching method that allows fine
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::646f0673c02679808afd609ab99584d8
https://doi.org/10.1063/1.1623002
https://doi.org/10.1063/1.1623002
Publikováno v:
Nanoscale. 4(14)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9171a4188714f73d329efc41e075140b
https://pubmed.ncbi.nlm.nih.gov/22706954
https://pubmed.ncbi.nlm.nih.gov/22706954
Publikováno v:
Nanoscale. 4(14)
An ultrafast synthesis method is presented for hexanethiolate-coated gold nanoclusters (d < 2 nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::21f6131c0aaffc7ed3c5db255604fedb
https://pubmed.ncbi.nlm.nih.gov/22695753
https://pubmed.ncbi.nlm.nih.gov/22695753
Publikováno v:
Applied Physics Letters. 80:2779-2781
We performed low-temperature near-field optical photoluminescence (PL) microscopy of a high-density (>100 μm−2) sample of single InAs/GaAs quantum dots (QDs) with very high spatial resolution. Six single QDs of different emission energies are spat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8145936d1f875efcc3a18db86a2cd96
https://doi.org/10.1063/1.1466536
https://doi.org/10.1063/1.1466536
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 26(10)
We report a fast and highly reproducible chemical synthesis method for colloidal gold nanoparticles which are negatively charged in nonpolar solvents and coated with hydrophobic organic molecules. If a hexane droplet containing charged gold nanoparti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::110cd02481052b9927c691dc78f6bbde
https://pubmed.ncbi.nlm.nih.gov/20392108
https://pubmed.ncbi.nlm.nih.gov/20392108