Zobrazeno 1 - 10
of 63
pro vyhledávání: '"Sang-Hun Seo"'
Publikováno v:
Current Applied Physics. 18:1436-1440
SiN and SiCN film production using plasma-enhanced atomic layer deposition (PE-ALD) is investigated in this study. A developed high-power and high-density multiple inductively coupled plasma (multi-ICP) source is used for a low temperature PE-ALD pro
Publikováno v:
Journal of Applied Physics; 10/15/2005, Vol. 98 Issue 8, p083302, 11p, 1 Diagram, 12 Graphs
Publikováno v:
Journal of Applied Physics; 8/15/2005, Vol. 98 Issue 4, p043301, 7p, 1 Diagram, 7 Graphs
Autor:
Sang-Hun Seo, Hong-Young Chang
Publikováno v:
Journal of Applied Physics; 8/1/2004, Vol. 96 Issue 3, p1310-1317, 8p, 7 Graphs
Publikováno v:
Journal of Applied Physics; 7/1/2004, Vol. 96 Issue 1, p57-64, 8p, 1 Diagram, 9 Graphs
Publikováno v:
Thin Solid Films. 518:6573-6577
The electronegativity in a continuous wave (CW) and pulsed mode plasmas was calculated using the measured results of both the single Langmuir probe and the retarding field analyzer. For the pulsed mode measurement, both of the measurements were perfo
Publikováno v:
Surface and Coatings Technology. 202:5298-5301
A novel pulsing technique has been proposed to enhance the deposition rate of film in high power pulsed magnetron sputtering (HPPMS). The detailed investigations on the temporal behavior of the plasma density have been done. The results have provided
Publikováno v:
Plasma Sources Science and Technology. 15:256-265
The spatiotemporal evolution of the electron energy distribution function (EEDF) and of plasma parameters such as the electron density, the electron temperature and the plasma and floating potentials has been investigated using spatially and temporal
Publikováno v:
Current Applied Physics. 6:235-238
A new type plasma source has been developed for the generation of low temperature plasma. The plasma generation process consists of two steps, the generation of metastable neutral gas by injecting a low energy electron beam (the thermionic source) an
Publikováno v:
Plasma Sources Science and Technology. 14:576-580
The temporal behaviour of the electron energy distribution function (EEDF) and the plasma parameters such as electron density, electron temperature and plasma and floating potentials in a mid-frequency pulsed dc magnetron plasma are investigated usin