Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Sang U. Kim"'
Autor:
Allen Chen, Sang U. Kim, Joon H. Min, Jang K. Kim, Jarod C. Limke, Dae Hwan Rhu, Young Jin Eum, Charles Wardle, Gi T. Park
Publikováno v:
Proceedings of the Water Environment Federation. 2012:2103-2110
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::491401dd5cd559512b3119802a7b3ee9
https://doi.org/10.2175/193864712811726040
https://doi.org/10.2175/193864712811726040
Publikováno v:
Microelectronics Reliability. 43:1461-1464
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ef5635a8e347c6c1f903378392c2fc3
https://doi.org/10.1016/s0026-2714(03)00259-2
https://doi.org/10.1016/s0026-2714(03)00259-2
Publikováno v:
Microelectronics Reliability. 41:1301-1305
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bca8cbc57f85867f07a39e02beb203f6
https://doi.org/10.1016/s0026-2714(01)00192-5
https://doi.org/10.1016/s0026-2714(01)00192-5
Autor:
Sang U. Kim
Publikováno v:
Journal of Electrostatics. 31:323-337
Using special test structures and techniques, ESD induced oxide-damage was conclusively identified. Electrical signatures uniquely associated with both catastrophic and “walking wounded” devices were determined along with process steps most criti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c810a94a7b0371c711f9e5c785da7136
https://doi.org/10.1016/0304-3886(93)90016-z
https://doi.org/10.1016/0304-3886(93)90016-z
Autor:
Joo Tae Moon, Beom Jun Jin, Young-pil Kim, Gi-Sung Yeo, Si-Young Choi, Sang U. Kim, U-In Chung, Sun-Ghil Lee
Publikováno v:
Proceedings of the 2004 International Conference on Microelectronic Test Structures (IEEE Cat. No.04CH37516).
A new test structure for a stacked capacitor DRAM cell transistors with a diagonal active-area was developed to analyze the leakage current characteristics of the cell transistors. The leakage current components of the low power DRAMs with different
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b94bacb0ecdb0d6f9d6c06c9ec5e50b
https://doi.org/10.1109/icmts.2004.1309467
https://doi.org/10.1109/icmts.2004.1309467
Publikováno v:
Extended Abstracts of the 1998 International Conference on Solid State Devices and Materials.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de2b0ddd1be3e78adcf931ec1acc9dbb
https://doi.org/10.7567/ssdm.1998.a-6-6
https://doi.org/10.7567/ssdm.1998.a-6-6
Publikováno v:
SPIE Proceedings.
Results on electrical characterization of test structures with fluorosilicate glass (FSG) deposited in fourdifferent chemical vapor deposition (CVD) tools are reported. Data demostrate high sensitivity of theelectrical properties of FSG to metal patt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bce701ddf47e6e6fcbe9f2346fb233dc
https://doi.org/10.1117/12.284639
https://doi.org/10.1117/12.284639
Root Cause Analysis of Thin Gate Oxide Degradation during Fabrication of Advanced CMOS ULSI Circuits
Autor:
Sang U. Kim
Publikováno v:
Extended Abstracts of the 1997 International Conference on Solid State Devices and Materials.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d36b36b43d11eb3e2ff6b1758732df89
https://doi.org/10.7567/ssdm.1997.a-1-2
https://doi.org/10.7567/ssdm.1997.a-1-2
Autor:
Sang U. Kim
Publikováno v:
2nd International Symposium on Plasma Process-Induced Damage.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0df5d53ed1bb5e1832a2a6681fb20121
https://doi.org/10.1109/ppid.1997.596739
https://doi.org/10.1109/ppid.1997.596739
Publikováno v:
Chest. 99(4)
The acute pulmonary responses of athletes after short-term exposure to ambient concentrations of NO2 during heavy exercise have been examined. Intercollegiate male athletes were screened for history of cardiac disease, respiratory disease, allergic c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f038cc970a111e0e1c8cfc5b6a5948cc
https://pubmed.ncbi.nlm.nih.gov/2009780
https://pubmed.ncbi.nlm.nih.gov/2009780