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pro vyhledávání: '"Sander van Reek"'
Autor:
Sander van Reek, Jetske Stortelder, Rob Snel, Sjoerd Oostrom, Alfred Abutan, Bert van der Zwan, Jacques van der Donck, Peter van der Walle
Publikováno v:
Extreme Ultraviolet (EUV) Lithography II, 28 February 2011 through 3 March 2011, San Jose, CA, USA, 7969
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the development of fab infrastructure for EUV masks. The absence of a pellicle makes the EUV reticles extremely vulnerable to particles. Therefore, the fab i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4676eb14d576fdefc2617771306192c7
http://resolver.tudelft.nl/uuid:d6769fe6-36d5-4176-92c6-8aafb0e127bb
http://resolver.tudelft.nl/uuid:d6769fe6-36d5-4176-92c6-8aafb0e127bb
