Výsledky vyhledávání - "Sana Rachidi"

Wet Alkaline Etching of Si Selectively to SiGe for sub 10 nm Gate All Around Architectures

Autor: Nicolas Posseme, Sana Rachidi, Alain Campo, Jean-Michel Hartmann, Virginie Loup

Publikováno v: ECS Journal of Solid State Science and Technology. 10:014007

Using alkaline chemistries for SiGe based Gate-All-Around architectures fabrication is still a challenge. This work reports a detailed study of Si to Si0.7Ge0.3 selective etching using NH4OH, TMAH and TEAH alkaline etchants. These alkaline solutions

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b9814dc9d487f8ab05b9c5f9574dabea
https://doi.org/10.1149/2162-8777/abddd8

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Isotropic dry etching of Si selectively to Si0.7Ge0.3 for CMOS sub-10 nm applications

Autor: Sébastien Barnola, Virginie Loup, Sana Rachidi, C. Vizioz, Jean-Michel Hartmann, Alain Campo, Nicolas Posseme

Publikováno v: Journal of Vacuum Science & Technology A. 38:033002

The fabrication of Si0.7Ge0.3 sub-10 nm nanochannels in gate-all-around devices requires a highly selective Si isotropic etching process. The etching of Si selectively to Si0.7Ge0.3 with CF4/N2/O2 downstream plasma has been investigated using various

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::70893cdf7b6eae5df2bcbdf16b88414c
https://doi.org/10.1116/1.5143118

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