Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Samuel Kalt"'
Autor:
Elaheh Akbarnejad, Aleksander Kostka, Yujiao Li, Matthias Karl Klein, Kamen Kozhuharov, Georg Fritz, Samuel Kalt, Alfred Ludwig
Publikováno v:
Advanced Materials Interfaces, Vol 11, Iss 20, Pp n/a-n/a (2024)
Abstract Interactions at high temperatures between thin films and the Si substrate limit materials discovery using combinatorial processing platforms (CPPs). To overcome this, a diffusion and reaction barrier, SiO2, by thermal oxidation of Si tips is
Externí odkaz:
https://doaj.org/article/9eeffedb6c7344a294d2d0f3968df5d4
Autor:
Gregory A. Dahlen, Georg Fritz, Johann Dr. Greschner, Samuel Kalt, Thomas Bayer, Hao-Chih Liu, Jason R. Osborne
Publikováno v:
SPIE Proceedings.
This paper reports on new developments of advanced CD AFM probes after the prior introduction of trident probes in SPIE Advanced Lithography 2007 [1]. Trident probes, having sharpened extensions in the tip apex region, make possible bottom CD mea
Autor:
Phillip L. Reu, Hans C. Pfeiffer, Carey M. Thiel, Samuel Kalt, Roxann L. Engelstad, Christopher F. Robinson, Michael S. Gordon, Johann Dr. Greschner, Obert Wood, R. S. Dhaliwal, Thomas Bayer, H. Weiss
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
Electron Projection Lithography ( EPL) is a leading candidate for the sub-65 nm lithography regime (1),(2). The development of a low-distortion mask is critical to the success of EPL. EPL has traditionally used either a stencil format mask with a sin
Autor:
Gaoliang Dai, Fan Zhu, Markus Heidelmann, Georg Fritz, Thomas Bayer, Samuel Kalt, Jens Fluegge
Publikováno v:
Measurement Science & Technology; Nov2015, Vol. 26 Issue 11, p1-1, 1p