Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Samit Barai"'
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 34:379-386
This work proposes a methodology to find lithography yield detractors using Design Rule Checks (DRC) that are derived from a supervised Machine Learning (ML) model. The probability of being an outlier in layout parameter domain has a strong correlati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::450ef93ce7c7a22e8c5117978517de3a
https://doi.org/10.1109/tsm.2021.3083973
https://doi.org/10.1109/tsm.2021.3083973
Publikováno v:
Materials Today: Proceedings. 2:1560-1567
Pulse Oximeter is an instrument, which non-invasively monitors the saturation of hemoglobin in arterial blood. Under normal physiological conditions, oxygen saturation ranges between 92%-100%. When saturation falls below the normal range, an unhealth
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7d88036450ca8b98994c205c5582e9d
https://doi.org/10.1016/j.matpr.2015.07.082
https://doi.org/10.1016/j.matpr.2015.07.082
Publikováno v:
Materials Today: Proceedings. 2:A1-A4
In this research article Figures 1, 2, 3a, 3b, 4, 5 are missing in the paper, that has to be rectified with the below figures
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4623a7b72850c0c7be010e12fd2dab74
https://doi.org/10.1016/j.matpr.2015.11.001
https://doi.org/10.1016/j.matpr.2015.11.001
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 18:1
With continuous downscaling of feature sizes, potentially problematic patterns (hotspots) have become a major issue in generation of optimized mask design for better printability. The lithography process sensitive patterns in a design lead to degrada
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95c2aabecd705c0ead73b4fbea8bd68f
https://doi.org/10.1117/1.jmm.18.2.023501
https://doi.org/10.1117/1.jmm.18.2.023501
Autor:
Samit Barai, Anurag Sharma
Publikováno v:
Optics Communications. 271:81-86
We present an improved optimal variational method (Vopt) to overcome the assumption of field separability in the two orthogonal directions. The improved Vopt method is shown to give accurate results with less computational effort. The method is appli
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc96a4fed15f68de7ca5f9f064a5caa4
https://doi.org/10.1016/j.optcom.2006.09.065
https://doi.org/10.1016/j.optcom.2006.09.065
Publikováno v:
Physics of Semiconductor Devices ISBN: 9783319030012
Full chip resist simulation is a critical step in the lithography simulation of advanced CMOS technology nodes. The semi-empirical compact models (such as compact model 1, also known as CM1) are generally used in the semiconductor industries for resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ac5fd06c9dc308e051e0a99bc76564f
https://doi.org/10.1007/978-3-319-03002-9_9
https://doi.org/10.1007/978-3-319-03002-9_9
Autor:
Aditya Padmawar, Tamer Desouky, Samit Barai, Ramana Murthy Pusuluri, James M. Oberschmidt, Om Jaiswal
Publikováno v:
SPIE Proceedings.
Process models have been in use for performing proximity corrections to designs for placement on lithography masks for a number of years. In order for these models to be used they must provide an adequate representation of the process while also allo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2f88fd5057e6e61719a0ecc9cd61105
https://doi.org/10.1117/12.897531
https://doi.org/10.1117/12.897531
Autor:
Samit Barai, Anurag Sharma
Publikováno v:
Journal of the Optical Society of America. A, Optics, image science, and vision. 26(4)
A new set of basis functions based on truncated Gaussian wavelets is proposed for optical waveguide analysis using the well-known Galerkin method. A spatially limited Gaussian wavelet train is formed by judiciously truncating the tails of Gaussian fu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3723f8c88e5d7e1ca34dd805d4dd8d2a
https://pubmed.ncbi.nlm.nih.gov/19340268
https://pubmed.ncbi.nlm.nih.gov/19340268