Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Sam X. Sun"'
Publikováno v:
D-Lib Magazine.
We report on a prototype project for a content rights registration and discovery service in China. It takes a federated approach to a content rights registration and discovery service framework that will be simple to operate and manage by individual
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
Plasma trimming is a method widely used to achieve small feature sizes beyond the capability of photolithography. Plasma processes reduce the dimensions of photoresist, anti-reflective coating, hardmask, or device substrate patterns with varying degr
Autor:
Jim D. Meador, Mariya Nagatkina, Sam X. Sun, Tomoyuki Enomoto, Denise Gum, Randy Bennett, Doug Holmes, Rama Puligadda
Publikováno v:
SPIE Proceedings.
This paper presents our progress in developing spin-on, thermosetting hardmasks and bottom antireflective coatings (BARCs) for 193-nm trilayer usage. Binder materials that were used in preparing the silicon-containing hardmasks include polymers with
Publikováno v:
Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications IV.
We are developing a set of dyed red, green, and blue color filter coatings for the fabrication of high resolution CCD and CMOS image sensor arrays. The resists contain photosensitive polymer binders and various curing agents, soluble organic dyes, an
Autor:
Guo Xiaofeng1 guofx@wanfangdata.com.cn, Li Ying1 liying@istic.ac.cn, Sam X. Sun ssun@cnri.reston.va.us
Publikováno v:
D-Lib Magazine. Nov/Dec2010, Vol. 16 Issue 11/12, p39-39. 1p.